Microelectronics, Volume. 55, Issue 1, 159(2025)

Study on High Sensitivity and Low Offset Hall Device Based on 0.18 μm BCD Process

LI Jielin1, LI Jianqiang2, LI Liang2, ZHOU Lin1, WANG Shuangxi1, and XU Yue1,3
Author Affiliations
  • 1College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing, 210023, P. R. China
  • 2Beijing Smartchip Microelectronics Technology Company Limited, Beijing 102200, P. R. China
  • 3National and Local Joint Engineering Laboratory of RF Integration & Micro-assembly Technology, Nanjing, 210023, P. R. China
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    In this study, we implemented a square Hall device based on a 0.18 μm Bipolar-CMOS-DMOS (BCD) process for high sensitivity and low offset. The magnetic sensitivity of the device is significantly improved by adopting the low-doped N-type drift layer as the active area and by using the buried P-type layer to reduce the thickness of the active area. Furthermore, we employed the static orthogonal coupling technique to reduce the output offset voltage. The tape-out test results indicate that the voltage-related sensitivity and current-related sensitivity of the proposed Hall device reach 4.14%V/(V·T) at a bias voltage of 3 V and 388 V/(A·T) at a bias current of 300 μA, respectively. Furthermore, the output offset voltage is as low as 0.3 mV by utilizing the coupling structure, demonstrating good four-phase symmetry. The residual offset voltage can be further reduced to less than 6 μV when the four-phase spanning current technique is applied.

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    LI Jielin, LI Jianqiang, LI Liang, ZHOU Lin, WANG Shuangxi, XU Yue. Study on High Sensitivity and Low Offset Hall Device Based on 0.18 μm BCD Process[J]. Microelectronics, 2025, 55(1): 159

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    Paper Information

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    Received: Apr. 29, 2024

    Accepted: Jun. 19, 2025

    Published Online: Jun. 19, 2025

    The Author Email:

    DOI:10.13911/j.cnki.1004-3365.240138

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