Microelectronics, Volume. 55, Issue 1, 159(2025)
Study on High Sensitivity and Low Offset Hall Device Based on 0.18 μm BCD Process
In this study, we implemented a square Hall device based on a 0.18 μm Bipolar-CMOS-DMOS (BCD) process for high sensitivity and low offset. The magnetic sensitivity of the device is significantly improved by adopting the low-doped N-type drift layer as the active area and by using the buried P-type layer to reduce the thickness of the active area. Furthermore, we employed the static orthogonal coupling technique to reduce the output offset voltage. The tape-out test results indicate that the voltage-related sensitivity and current-related sensitivity of the proposed Hall device reach 4.14%V/(V·T) at a bias voltage of 3 V and 388 V/(A·T) at a bias current of 300 μA, respectively. Furthermore, the output offset voltage is as low as 0.3 mV by utilizing the coupling structure, demonstrating good four-phase symmetry. The residual offset voltage can be further reduced to less than 6 μV when the four-phase spanning current technique is applied.
Get Citation
Copy Citation Text
LI Jielin, LI Jianqiang, LI Liang, ZHOU Lin, WANG Shuangxi, XU Yue. Study on High Sensitivity and Low Offset Hall Device Based on 0.18 μm BCD Process[J]. Microelectronics, 2025, 55(1): 159
Category:
Received: Apr. 29, 2024
Accepted: Jun. 19, 2025
Published Online: Jun. 19, 2025
The Author Email: