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Acta Optica Sinica, Volume. 30, Issue 3, 907(2010)

Cleaning of Carbon Contamination on Si Wafer with Activated Oxygen by Synchrotron Radiation

Zhou Hongjun1、*, Zhong Pengfei2, Huo Tonglin1, Jiang Xinting1, and Zheng Jinjin2
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    Zhou Hongjun, Zhong Pengfei, Huo Tonglin, Jiang Xinting, Zheng Jinjin. Cleaning of Carbon Contamination on Si Wafer with Activated Oxygen by Synchrotron Radiation[J]. Acta Optica Sinica, 2010, 30(3): 907

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    Paper Information

    Category: X-Ray Optics

    Received: Mar. 27, 2009

    Accepted: --

    Published Online: Mar. 11, 2010

    The Author Email: Zhou Hongjun (hjzhou@ustc.edu.cn)

    DOI:10.3788/aos20103003.0907

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology