Acta Optica Sinica, Volume. 31, Issue 10, 1005002(2011)

Vector Analysis of Diffractive Optical Elements for Off-Axis Illumination of Projection Lithographic System

Zhang Wei* and Gong Yan
Author Affiliations
  • [in Chinese]
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    CLP Journals

    [1] Hu Zhonghua, Zhu Jing, Yang Baoxi, Pen Xuefeng, Zeng Aijun, Huang Huijie. Far-Field Multi-Parameter Measurement of Diffractive Optical Element for Pupil Shaping in Lithography System[J]. Chinese Journal of Lasers, 2013, 40(9): 908001

    [2] Song Qiang, Zhu Jing, Wang Jian, Zhang Fang, Lü Xiangbo, Yang Baoxi, Huang Huijie. A Mixed Gradient Algorithm for High Performance DOE Design in Off-Axis Lithography Illumination System[J]. Acta Optica Sinica, 2015, 35(1): 122005

    [3] [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Polarization Analysis of a Real High Numerical Aperture Optical LithographyLuo Hongmei[J]. Acta Optica Sinica, 2013, 33(11): 1122002

    [4] Yang Liangliang, Cui Qingfeng, Liu Tao, Xue Changxi. Measurement of Diffraction Efficiency for Diffractive Optical Elements[J]. Acta Optica Sinica, 2012, 32(4): 412007

    [5] Tang Feilong, Li Zhongliang, Bu Yang, Wang Xiangzhao, Fan Lili, Cao Shaoqian. Method of Improving Measurement Accuracy of Stokes Parameters[J]. Chinese Journal of Lasers, 2013, 40(4): 408006

    [6] Hu Zhonghua, Yang Baoxi, Zhu Jing, Xiao Yanfen, Zeng Aijun, Huang Huijie. Design of Diffractive Optical Element for Pupil Shaping Optics in Projection Lithography System[J]. Chinese Journal of Lasers, 2013, 40(6): 616001

    [7] Li Meixuan, Li Hong, Zhang Siqi, Zhang Wenying, Guo Ming. Design of diffractive optical element based on discrete sampling encryption algorithm[J]. Infrared and Laser Engineering, 2019, 48(9): 916004

    [8] Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System[J]. Acta Optica Sinica, 2018, 38(7): 0722001

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    Zhang Wei, Gong Yan. Vector Analysis of Diffractive Optical Elements for Off-Axis Illumination of Projection Lithographic System[J]. Acta Optica Sinica, 2011, 31(10): 1005002

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    Paper Information

    Category: Diffraction and Gratings

    Received: Apr. 19, 2011

    Accepted: --

    Published Online: Sep. 29, 2011

    The Author Email: Wei Zhang (zhangw@sklao.ac.cn)

    DOI:10.3788/aos201131.1005002

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