Opto-Electronic Engineering, Volume. 40, Issue 2, 87(2013)

Impact of Non-ideal Illumination Pupil on Imaging Performance of Lithography

CHEN An1,2、*, LIN Wumei1, and JIANG Haibo1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    References(3)

    [4] [4] Mark C Phillips, Steve D Slonaker, Chris Treadwaya, et al. Influence of illumination tilt on imaging [J]. Proceedings of SPIE(S0277-786X), 2005, 5754: 1562-1573.

    [8] [8] Steve Slonaker, Bryan Riffel, Hisashi Nishinaga, et al. Challenges and solutions in the calibration of projection lens pupil-image metrology tools [J]. Proceedings of SPIE(S0277-786X), 2009, 7274: 72740V1-72740V10.

    [9] [9] Takeaki Ebihara, Hideyuki Saito, Takafumi Miyaharu, et al. Characterization of Imaging Performance: Considering Both Illumination Intensity Profile and Lens Aberration [J]. Proceedings of SPIE(S0277-786X), 2005, 5754: 1693-1703.

    CLP Journals

    [1] CHEN Huanan, GUO Kang, ZHANG Linghua, LIU Jian, SHANG Hongbo. Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective[J]. Opto-Electronic Engineering, 2015, 42(6): 50

    [2] ZHANG Liyuna, LIU Nanyana, HOU Yuanbinb, LIU Xiaojiana. Uneven Illumination Image Segmentation Based on Multi-threshold S-F[J]. Opto-Electronic Engineering, 2014, 41(7): 81

    [3] LI Shiwen, ZHANG Bin, LIU Zemin, LIANG Xiaoxiao. Noise Reduction for OCT Images Based on Wave-atom Thresholding Algorithm[J]. Opto-Electronic Engineering, 2014, 41(7): 75

    Tools

    Get Citation

    Copy Citation Text

    CHEN An, LIN Wumei, JIANG Haibo. Impact of Non-ideal Illumination Pupil on Imaging Performance of Lithography[J]. Opto-Electronic Engineering, 2013, 40(2): 87

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Jun. 21, 2012

    Accepted: --

    Published Online: Mar. 5, 2013

    The Author Email: An CHEN (627555070@qq.com)

    DOI:10.3969/j.issn.1003-501x.2013.02.014

    Topics