[4] [4] Jessica G G, Thomas H, Paul H, et al. Method of Problem Solving to Diagnose High Particle Failures Due to Unique Rotation Stopping Position \[C\]. Beijing: 29th Annual SEMI Advanced Semiconductor Manufacturing Conference, 2018.

[5] [5] Tsuyoshi M, Hiroyuki N, Hiroshi N, et al. Particle Reduction and Control in Plasma Etching Equipment \[J\]. IEEE Transactions on Semiconductor Manufacturing, 2005, 18: 477-486.