INFRARED, Volume. 44, Issue 7, 26(2023)
Analysis of Stick Particle Defect and Countermeasure in28 nm Polysilicon Hard Mask Etching
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XU Jin. Analysis of Stick Particle Defect and Countermeasure in28 nm Polysilicon Hard Mask Etching[J]. INFRARED, 2023, 44(7): 26
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Received: Apr. 12, 2023
Accepted: --
Published Online: Jan. 15, 2024
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