Chinese Journal of Lasers, Volume. 36, Issue 5, 1200(2009)
Effect of Annealing on HfO2/SiO2, Y2O3/SiO2 Multilayer Thin Films
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Yuan Jingmei, He Hongbo, Yi Kui, Shao Jianda, Fan Zhengxiu. Effect of Annealing on HfO2/SiO2, Y2O3/SiO2 Multilayer Thin Films[J]. Chinese Journal of Lasers, 2009, 36(5): 1200