Chinese Journal of Lasers, Volume. 40, Issue 9, 907001(2013)

Realization of Antireflection Coatings for 193 nm P-Polarized Light at Large Angle

Li Chun1、*, Jin Chunshui1, Jin Jingcheng1,2, and Chang Yanhe1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    References(13)

    [2] [2] V B Fleurov, D J Colon Ⅲ, D J W Brown, et al.. Dual-chamber ultra line-narrowed excimer light source for 193 nm lithography[C]. SPIE, 2003, 5040: 1694-1703.

    [3] [3] M Bischoff, D Gabler, N Kaiser, et al.. Optical and structural properties of LaF3 thin films[J]. Appl Opt, 2008, 47(13): C157-C161.

    [4] [4] Y Taki, K Muramatsu. Hetero-epitaxial growth and optical properties of LaF3 on CaF2[J]. Thin Solid Films, 2002, 420-421: 30-37.

    [5] [5] D Ristau, S Günster, S Bosch, et al.. Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation[J]. Appl Opt, 2002, 41(16): 3196-3204.

    [6] [6] Y Taki. Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography[J]. Vacuum, 2004, 74(3-4): 431-435.

    [7] [7] M Bischoff, O Stenzel, K Friedrich, et al.. Plasma-assisted deposition of metal fluoride coatings and modeling the extinction coefficient of as-deposited single layers[J]. Appl Opt, 2011, 50(9): C232-C238.

    [8] [8] Liu Mingchung, Lee Chengchung, Kaneko Masaaki, et al.. Microstructure related properties of lanthanum fluoride films deposited by molybdenum boat evaporation at 193 nm[J]. Thin Solid Films, 2005, 492: 45-51.

    [9] [9] T Roland, H Joerg, U Hein, et al.. Optical, structural, and mechanical properties of gadolinium tri-fluoride thin films grown on amorphous substrates[C]. SPIE, 2005, 5963: 59630O.

    [11] [11] Chang Yanhe, Jin Chunshui, Li Chun, et al.. Characterization of optical constants of ultraviolet LaF3 films by thermal evaporation[J]. Chinese J Lasers, 2012, 39(8): 0807002.

    [12] [12] Shang Shuzhen, Shao Jianda, Fan Zhengxiu, et al.. The study of ultraviolet properties of resistant-boat evaporated LaF3 films[J]. Acta Physica Sinica, 2008, 57(3): 1941-1945.

    [13] [13] Tang Jinfa, Gu Peifu, Liu Xu, et al.. Modern Optical Thin Film Technology[M]. Hangzhou: Zhejiang University Press, 2006. 330-332.

    Tools

    Get Citation

    Copy Citation Text

    Li Chun, Jin Chunshui, Jin Jingcheng, Chang Yanhe. Realization of Antireflection Coatings for 193 nm P-Polarized Light at Large Angle[J]. Chinese Journal of Lasers, 2013, 40(9): 907001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: materials and thin films

    Received: Feb. 27, 2013

    Accepted: --

    Published Online: Aug. 27, 2013

    The Author Email: Chun Li (lifshu1012@aliyun.com)

    DOI:10.3788/cjl201340.0907001

    Topics