Acta Optica Sinica, Volume. 20, Issue 4, 543(2000)
Phase Shifting Mask for 0.35 μm Contact Holes
References(3)
[1] [1] Rai-Choudhury P. Handbook of Lithography. Bellingham: SPIE Optical Engineering Press, 1997.
[2] [2] Levenson M D, Viswanathan N S, Simpson R A. Improving resolution in photolithography with a phase shifting mask. IEEE Transaction on Electron Devices, 1982, ED-29(12):1828～1836
[3] [3] Hopkins. On the diffraction theory of optical images. Proc. Roy. Soc., 1953, A217(2):408～420
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Phase Shifting Mask for 0.35 μm Contact Holes[J]. Acta Optica Sinica, 2000, 20(4): 543
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