Researching | Molecular sieves assisted chemical vapor deposition preparation of high-κ dielectric m-ZrO2 nanosheets

Journal of Semiconductors, Volume. 46, Issue 4, 042703(2025)

Molecular sieves assisted chemical vapor deposition preparation of high-κ dielectric m-ZrO₂ nanosheets

Ting Lu¹, Zhuojun Duan^1、*, Ling Zhang¹, Yuanyuan Jin², Huimin Li¹, and Song Liu^1,3、**

Author Affiliations

¹College of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, China

²Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong 999077, China

³Shenzhen Research Institute, Hunan University, Shenzhen 518000, China

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Ting Lu, Zhuojun Duan, Ling Zhang, Yuanyuan Jin, Huimin Li, Song Liu. Molecular sieves assisted chemical vapor deposition preparation of high-κ dielectric m-ZrO₂ nanosheets[J]. Journal of Semiconductors, 2025, 46(4): 042703

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Paper Information

Category: Research Articles

Received: Sep. 18, 2024

Accepted: --

Published Online: May. 21, 2025

The Author Email: Zhuojun Duan (ZJDuan), Song Liu (SLiu)

DOI:10.1088/1674-4926/24090034

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