Acta Optica Sinica, Volume. 34, Issue 9, 911002(2014)
Source and Mask Optimization Using Stochastic Parallel Gradient Descent Algorithm in Optical Lithography
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Li Zhaoze, Li Sikun, Wang Xiangzhao. Source and Mask Optimization Using Stochastic Parallel Gradient Descent Algorithm in Optical Lithography[J]. Acta Optica Sinica, 2014, 34(9): 911002
Paper Information
Category: Imaging Systems
Received: Feb. 2, 2014
Accepted: --
Published Online: Aug. 12, 2014
The Author Email: Zhaoze Li (lizhaozezone@163.com)
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