Semiconductor Optoelectronics, Volume. 46, Issue 1, 63(2025)
Simulation and Experimental Study on Precursor Distribution in Tungsten Thin Film Atomic Layer Deposition Chamber
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LIU Zhiyuan, WANG Guozheng, XU Zihao, JIANG Entong, GAO Guanhua, YANG Jikai. Simulation and Experimental Study on Precursor Distribution in Tungsten Thin Film Atomic Layer Deposition Chamber[J]. Semiconductor Optoelectronics, 2025, 46(1): 63
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Received: Dec. 17, 2024
Accepted: Sep. 18, 2025
Published Online: Sep. 18, 2025
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