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Semiconductor Optoelectronics, Volume. 46, Issue 1, 63(2025)

Simulation and Experimental Study on Precursor Distribution in Tungsten Thin Film Atomic Layer Deposition Chamber

LIU Zhiyuan, WANG Guozheng, XU Zihao, JIANG Entong, GAO Guanhua, and YANG Jikai
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  • College of Physics, Changchun University of Science and Technology, Changchun 130022, CHN
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    LIU Zhiyuan, WANG Guozheng, XU Zihao, JIANG Entong, GAO Guanhua, YANG Jikai. Simulation and Experimental Study on Precursor Distribution in Tungsten Thin Film Atomic Layer Deposition Chamber[J]. Semiconductor Optoelectronics, 2025, 46(1): 63

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    Received: Dec. 17, 2024

    Accepted: Sep. 18, 2025

    Published Online: Sep. 18, 2025

    The Author Email:

    DOI:10.16818/j.issn1001-5868.20241217002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology