Chinese Journal of Lasers, Volume. 28, Issue 1, 36(2001)
Laser-assisted Plasma-enhanced Chemical Vapor Deposition for Silicon Nitride Thin Film
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[in Chinese], [in Chinese], [in Chinese], [in Chinese]. Laser-assisted Plasma-enhanced Chemical Vapor Deposition for Silicon Nitride Thin Film[J]. Chinese Journal of Lasers, 2001, 28(1): 36
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