Chinese Journal of Lasers, Volume. 51, Issue 22, 2201003(2024)

Design of Micromirror Array for Freeform Illumination in Lithography Systems

Jingwei Zhang1,2, Jingpei Hu1,2、*, Mengjie Sun3、**, Jiahao Hu3, Aijun Zeng1,2, and Huijie Huang1,2
Author Affiliations
  • 1Laboratory of Information Optics and Optoelectronic Technology Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Shanghai Light-Wonder Optics Co., Ltd., Shanghai 201800, China
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    Figures & Tables(15)
    Schematics of pupil shaping based on MMA. (a) Two illumination source shapes generated by MMA; (b) MMA for pupil shaping device; (c) structure of designed micromirror
    Schematics of electrostatically actuated micromirror with single serprntine beam. (a) Micromirror structure; (b) tilt of micromirror
    Schematic of rectangular micromirror
    Structure of designed micromirror. (a) Electrode; (b) serpentine beam
    Voltage-displacement curves actuated by initial electrode structure
    Vibrational modes of micromirror. (a) Torsion motion around x axis; (b) mirror translation; (c) torsion motion around y axis
    Schematic of optimized stepped electrodes
    Voltage-displacement curves under flat electrode and stepped electrode actuation
    Stress distributions in torsion micromirror under Con. 3 condition. (a) Stress distribution in micromirror with flat electrodes; (b) stress distribution in micromirror with stepped electrodes; (c) stress distribution of serpentine beam in micromirror with flat electrodes; (d) stress distribution of serpentine beam in micromirror with stepped electrodes
    • Table 1. Structure parameters of designed micromirror

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      Table 1. Structure parameters of designed micromirror

      PartParameterValue /µm
      Plated10
      Rp400
      Gaphg63
      de40
      ElectrodeRe400
      We33.6
      d140
      d264
      ds3
      Ls100
    • Table 2. Serpentine beam parameters (lengths)

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      Table 2. Serpentine beam parameters (lengths)

      ili /µmjlj /µm
      112.251177.00
      211.502134.00
      311.003,5,8‒12116.00
      410.754121.75
      510.0069.75
      69.7579.50
      79.50
      8‒1210.00
    • Table 3. Serpentine beam parameters (widths)

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      Table 3. Serpentine beam parameters (widths)

      iwi /µmjwj /µm
      1‒36.016.5
      4, 55.52‒46.0
      65.05,65.5
      7‒134.075.0
      8‒134.0
    • Table 4. Material parameters of monocrystalline silicon

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      Table 4. Material parameters of monocrystalline silicon

      ParameterValue
      Density2329 kg/m3
      Shear modulus170×109 Pa
      Poisson ratio0.28
    • Table 5. Electrode configurations for micromirror

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      Table 5. Electrode configurations for micromirror

      Operating configurationActuated electrode
      Con. 11
      Con. 22
      Con. 31, 2
    • Table 6. Resonance frequencies

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      Table 6. Resonance frequencies

      ModeResonance frequency /Hz
      First order846.96
      Second order1202.60
      Third order2315.40
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    Jingwei Zhang, Jingpei Hu, Mengjie Sun, Jiahao Hu, Aijun Zeng, Huijie Huang. Design of Micromirror Array for Freeform Illumination in Lithography Systems[J]. Chinese Journal of Lasers, 2024, 51(22): 2201003

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    Paper Information

    Category: laser devices and laser physics

    Received: Jan. 12, 2024

    Accepted: Mar. 6, 2024

    Published Online: Nov. 14, 2024

    The Author Email: Jingpei Hu (hujingpei@siom.ac.cn), Mengjie Sun (sunmengjie@sh-lwoc.com)

    DOI:10.3788/CJL240490

    CSTR:32183.14.CJL240490

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