Design of Micromirror Array for Freeform Illumination in Lithography Systems

Jingwei Zhang; Jingpei Hu; Mengjie Sun; Jiahao Hu; Aijun Zeng; Huijie Huang

doi:10.3788/CJL240490

Chinese Journal of Lasers, Volume. 51, Issue 22, 2201003(2024)

Design of Micromirror Array for Freeform Illumination in Lithography Systems

Jingwei Zhang^1,2, Jingpei Hu^1,2、*, Mengjie Sun^3、**, Jiahao Hu³, Aijun Zeng^1,2, and Huijie Huang^1,2

¹Laboratory of Information Optics and Optoelectronic Technology Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²University of Chinese Academy of Sciences, Beijing 100049, China

³Shanghai Light-Wonder Optics Co., Ltd., Shanghai 201800, China

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Jingwei Zhang, Jingpei Hu, Mengjie Sun, Jiahao Hu, Aijun Zeng, Huijie Huang. Design of Micromirror Array for Freeform Illumination in Lithography Systems[J]. Chinese Journal of Lasers, 2024, 51(22): 2201003

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Paper Information

Category: laser devices and laser physics

Received: Jan. 12, 2024

Accepted: Mar. 6, 2024

Published Online: Nov. 14, 2024

The Author Email: Jingpei Hu (hujingpei@siom.ac.cn), Mengjie Sun (sunmengjie@sh-lwoc.com)

DOI:10.3788/CJL240490

CSTR:32183.14.CJL240490

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology