Opto-Electronic Engineering, Volume. 35, Issue 9, 27(2008)
Alignment Model of Moiré and its Application in Nanometer Lithography
[1] [1] Lord Raleigh.On the manufacture and theory of diffraction gratings[J].Phil.Mag.Ser,1874,47:193-205
[2] [2] Lord Raleigh.On copying diffraction-gratings,and on some phenomena connected therewith[J].Phil.Mag.Ser,1881,11:196-205
[3] [3] King M C,Berry D H.Photolithographic mask alignment using moire techniques[J].J.Vae.Sei.Technol B,1972,11:2455-2458
[4] [4] Uchida Y,Hattori S,Nomura T.An automatic mask alignment technique using Moiré interference[J].J.Vac.Sci.Technol B,1987,5:244-247
[5] [5] Nishijima Y,Oster G Moiré Patterns:Their Application to Refractive Index and Refractive Index Gradient Measurements[J].J.Opt.Soc.Am.A,1964,54:1-5
[7] [7] McIlraith A H.The physics of moiré fringes[J].Phy.Edue,1970,5:106-112
[9] [9] OsterG,Wasserman M,Zwerling C.Theorctical Interpretation of Moiré Pattems[J].J.Opt.Soc.Am.A,1964,54:169-175
[10] [10] ZHOU Shao-lin,FU Yong-qi,TANG Xiao-ping,et al.Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography[J].Opt.Express,2008,16:7869-7880
Get Citation
Copy Citation Text
ZHOU Shao-lin, CHEN Wang-fu, YANG Yong, TANG Xiao-ping, HU Song, MA Ping, YAN Wei, ZHANG You-lin. Alignment Model of Moiré and its Application in Nanometer Lithography[J]. Opto-Electronic Engineering, 2008, 35(9): 27
Category:
Received: Dec. 14, 2007
Accepted: --
Published Online: Mar. 1, 2010
The Author Email: Shao-lin ZHOU (xiangyayong@163.com)
CSTR:32186.14.