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Opto-Electronic Engineering, Volume. 35, Issue 9, 27(2008)

Alignment Model of Moiré and its Application in Nanometer Lithography

ZHOU Shao-lin1,2、*, CHEN Wang-fu1,2, YANG Yong1,2, TANG Xiao-ping1, HU Song1, MA Ping1, YAN Wei1, and ZHANG You-lin3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    ZHOU Shao-lin, CHEN Wang-fu, YANG Yong, TANG Xiao-ping, HU Song, MA Ping, YAN Wei, ZHANG You-lin. Alignment Model of Moiré and its Application in Nanometer Lithography[J]. Opto-Electronic Engineering, 2008, 35(9): 27

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    Paper Information

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    Received: Dec. 14, 2007

    Accepted: --

    Published Online: Mar. 1, 2010

    The Author Email: Shao-lin ZHOU (xiangyayong@163.com)

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology