Acta Optica Sinica, Volume. 41, Issue 18, 1831001(2021)
Microstructure and Stress of Zr Thin Film Deposited by Pulsed DC Sputtering
Fig. 2. X-ray diffraction patterns of Zr films on different substrates. (a) JGS1; (b) silicon
Fig. 3. Instensity of diffraction peak of Zr films on different substrates. (a) JGS1; (b) silicon
Fig. 6. Surface metrology of Zr film deposited at different sputtering pressures. (a) 0.05 Pa, before deposition; (b) 0.2 Pa, before deposition; (c) 0.05 Pa, after deposition; (d) 0.2 Pa, after deposition
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Jingtao Zhu, Sheng Guo, Jiaoling Zhao, Jiayi Zhang, Hangyu Zhu, Jianda Shao. Microstructure and Stress of Zr Thin Film Deposited by Pulsed DC Sputtering[J]. Acta Optica Sinica, 2021, 41(18): 1831001
Category: Thin Films
Received: Mar. 12, 2021
Accepted: Apr. 7, 2021
Published Online: Sep. 3, 2021
The Author Email: Zhao Jiaoling (jolin923@siom.ac.cn)