Microstructure and Stress of Zr Thin Film Deposited by Pulsed DC Sputtering

Jingtao Zhu; Sheng Guo; Jiaoling Zhao; Jiayi Zhang; Hangyu Zhu; Jianda Shao

doi:10.3788/AOS202141.1831001

Acta Optica Sinica, Volume. 41, Issue 18, 1831001(2021)

Microstructure and Stress of Zr Thin Film Deposited by Pulsed DC Sputtering

Jingtao Zhu^1,2, Sheng Guo^1,2, Jiaoling Zhao^2,3、*, Jiayi Zhang^1,2, Hangyu Zhu^1,2, and Jianda Shao^2,3,4

Author Affiliations

¹School of Physics Science and Engineering, Tongji University, Shanghai 200092, China

²Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

³Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

⁴Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, Zhejiang 310024, China

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Jingtao Zhu, Sheng Guo, Jiaoling Zhao, Jiayi Zhang, Hangyu Zhu, Jianda Shao. Microstructure and Stress of Zr Thin Film Deposited by Pulsed DC Sputtering[J]. Acta Optica Sinica, 2021, 41(18): 1831001

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Paper Information

Category: Thin Films

Received: Mar. 12, 2021

Accepted: Apr. 7, 2021

Published Online: Sep. 3, 2021

The Author Email: Zhao Jiaoling (jolin923@siom.ac.cn)

DOI:10.3788/AOS202141.1831001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology