Optoelectronic Technology, Volume. 41, Issue 4, 274(2021)

Research on Photomask Defects Path Optimization Based on Ant Colony Algorithm Mixed with 2⁃opt

Zhijun XU1, Yateng WANG1, and Qilong XIONG1,2
Author Affiliations
  • 1Hefei Qingyi Photomask Ltd., Hefei,2300,CHN
  • 2Shenzhen Qingyi Photomask Ltd., Shenzhen Guangdong,518053,CHN
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    References(11)

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    Zhijun XU, Yateng WANG, Qilong XIONG. Research on Photomask Defects Path Optimization Based on Ant Colony Algorithm Mixed with 2⁃opt[J]. Optoelectronic Technology, 2021, 41(4): 274

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    Paper Information

    Category: Research and Trial-manufacture

    Received: May. 12, 2021

    Accepted: --

    Published Online: Aug. 3, 2022

    The Author Email:

    DOI:10.19453/j.cnki.1005-488x.2021.04.006

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