Tolerance Analysis of Micromirror Array in Deep Ultraviolet Lithography Illumination System

Chao Yin; Yanqiu Li; Xu Yan; Ke Liu; Lihui Liu

doi:10.3788/AOS202040.0722001

Acta Optica Sinica, Volume. 40, Issue 7, 0722001(2020)

Tolerance Analysis of Micromirror Array in Deep Ultraviolet Lithography Illumination System

Chao Yin, Yanqiu Li^*, Xu Yan, Ke Liu, and Lihui Liu

Key Laboratory of Photoelectronic Imaging Technology and System, Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

show less

Abstract Get PDF(in Chinese)

Figures & Tables(14)

Fig. 1. Layout of beam shaping unit

Download full size

Fig. 2. Schematic of rotation angle characteristic and reflective light path of micromirror

Download full size

Fig. 3. Flow chart of tolerance analysis of MMA

Download full size

Fig. 4. Intensity distributions of illumination modes. (a) QI; (b) DI; (c) Zernike

Download full size

Fig. 5. Exposure results of angle adjustment error for three kinds of illumination modes. (a) QI; (b) DI; (c) Zernike

Download full size

Fig. 6. Exposure results of process angle error for three kinds of illumination modes. (a) QI; (b) DI; (c) Zernike

Download full size

Fig. 7. Exposure results for different Δα and Δβ. (a) Angle adjustment error; (b) process angle error

Download full size

Fig. 8. Cumulative probability distribution of Δd_CD under tolerance

Download full size

Table 1. Main design specifications of MMA
View table
Table 1. Main design specifications of MMA
Parameter Number Size Gap Radius
Value 71×71 0.500 mm×0.707 mm 0.0500 mm×0.0707 mm +∞

Table 2. Main design specification of other elements
View table
Table 2. Main design specification of other elements
Parameter Focus of microlens /mm Focus of relay condenser /mm Diameter of pupil plane /mm
Value 164.7 1000 150

Table 3. Simulation results of angle of micromirror
View table
Table 3. Simulation results of angle of micromirror
Rotation angle (α, β) /(°) (0, 0) (2.12, 0) (-2.12, 0) (0, 3) (0, -3)
Center coordinate (x, y) /mm (0, 0) (0, -74.23) (0, 74.23) (-74.23, 2.25) (74.23, 2.25)

Table 4. Exposure results of ideal illumination mode
View table
Table 4. Exposure results of ideal illumination mode
Illumination mode CDE /% Δd_CD /nm
QI 0.96 0.269
DI 1.06 0.297
Zernike 0.20 0.056

Table 5. Exposure results of error illumination mode simulated by Matlab
View table
Table 5. Exposure results of error illumination mode simulated by Matlab
Illumination mode CDE /% Δd_CD /nm
QI 1.20 0.336
DI 1.21 0.339
Zernike 0.28 0.078

Table 6. Exposure results of error illumination mode simulated by LightTools
View table
Table 6. Exposure results of error illumination mode simulated by LightTools
Illumination mode CDE /% Δd_CD /nm
QI 1.35 0.378
DI 1.23 0.344
Zernike 0.28 0.078

Tools

Get Citation

Copy Citation Text

Chao Yin, Yanqiu Li, Xu Yan, Ke Liu, Lihui Liu. Tolerance Analysis of Micromirror Array in Deep Ultraviolet Lithography Illumination System[J]. Acta Optica Sinica, 2020, 40(7): 0722001

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites