Tolerance Analysis of Micromirror Array in Deep Ultraviolet Lithography Illumination System

Chao Yin; Yanqiu Li; Xu Yan; Ke Liu; Lihui Liu

doi:10.3788/AOS202040.0722001

Acta Optica Sinica, Volume. 40, Issue 7, 0722001(2020)

Tolerance Analysis of Micromirror Array in Deep Ultraviolet Lithography Illumination System

Chao Yin, Yanqiu Li^*, Xu Yan, Ke Liu, and Lihui Liu

Key Laboratory of Photoelectronic Imaging Technology and System, Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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Chao Yin, Yanqiu Li, Xu Yan, Ke Liu, Lihui Liu. Tolerance Analysis of Micromirror Array in Deep Ultraviolet Lithography Illumination System[J]. Acta Optica Sinica, 2020, 40(7): 0722001

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Paper Information

Category: Optical Design and Fabrication

Received: Oct. 8, 2019

Accepted: Dec. 26, 2019

Published Online: Apr. 15, 2020

The Author Email: Yanqiu Li (liyanqiu@bit.edu.cn)

DOI:10.3788/AOS202040.0722001

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