[1] Arndt D P. Azzam R M A, Bennett J M, et al. Multiple determination of the optical constants of thin-film coating materials[J]. Applied Optics., 23, 3571-3596(1984).

[2] Kamble N M, Tokas R B, Biswas A. et al. Determination of the optical constants of HfO2-SiO2 composite thin films through reverse fitting of transmission spectra[J]. Vacuum, 86, 422-428(2011). http://www.sciencedirect.com/science/article/pii/S0042207X11003381

[3] Shapovalov V I, Morozova A A, Lapshin A E. Determination of optical constants of thin dielectric films using the spectral transmission coefficient[J]. Glass Physics & Chemistry, 40, 341-345(2014). http://link.springer.com/article/10.1134/S1087659614030195

[4] Denton R E, Campbell R D, Tomlin S G. The determination of the optical constants of thin films from measurements of reflectance and transmittance at normal incidence[J]. Journal of Physics D: Applied Physics, 5, 852-863(2002). http://www.ingentaconnect.com/content/iop/jphysd/1972/00000005/00000004/art00029

[5] Zhang K Q, Yen Y H. Determining optical constants using an infrared ellipsometer[J]. Applied Optics, 28, 2929-2934(1989). http://www.ncbi.nlm.nih.gov/pubmed/20555625

[6] Kim S Y, Irene E A. An evaluation of errors in determining the refractive index and thickness of thin SiO2 films using a rotating analyzer ellipsometer[J]. Review of Scientific Instruments, 66, 5277-5281(1995). http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=4992474

[8] Wu Q H, Hodgkinson I. Precision of Brewster-angle methods for optical thin films[J]. Journal of the Optical Society of America A, 10, 2072-2075(1993). http://www.opticsinfobase.org/josaa/abstract.cfm?uri=josaa-10-9-2072

[9] Ferlauto A S, Ferreira G M, Pearce J M. et al. Analytical model for the optical functions of amorphous semiconductors from the near infrared to ultraviolet: Applications in thin film photovoltaics[J]. Journal of Applied Physics, 92, 2424-2436(2002). http://ieeexplore.ieee.org/xpl/abstractReferences.jsp?arnumber=5034080

[10] Burge D K, Bennett H E. Effect of a thin surface film on the ellipsometric determination of optical constants[J]. Journal of the Optical Society of America, 54, 1428-1433(1964). http://www.opticsinfobase.org/abstract.cfm?URI=josa-54-12-1428

[11] Aspnes D E, Theeten J B, Hottier F. Investigation of effective-medium models of microscopic surface roughness by spectroscopic ellipsometry[J]. Physical Review B, 20, 3292-3302(1979). http://adsabs.harvard.edu/abs/1979PhRvB..20.3292A

[12] Zhou Yi, Wu Guosong, Dai Wei et al. Accurate determination of optical constants and thickness of absorbing thin films by a combined ellipsometry and spectrophotometry approach[J]. Acta Physica Sinica, 59, 2356-2363(2010).

[13] Dobrowolski J A, Kemp R A. Refinement of optical multilayer systems with different optimization procedures[J]. Applied Optics, 29, 2876-2893(1990). http://www.opticsinfobase.org/abstract.cfm?uri=ao-29-19-2876

[14] Liu Huasong, Ji Yiqin, Zhang Feng et al. Dispersive properties of optical constants of some metallic oxide thin films in the mid-infrared regions[J]. Acta Optica Sinica, 34, 0831003(2014).

[15] Tikhonravov A V, Trubetskov M K, Tikhonravov A A et al. Effects of interface roughness on the spectral properties of thin films and multilayers[J]. Applied Optics, 42, 5140-5148(2003). http://www.opticsinfobase.org/abstract.cfm?uri=ao-42-25-5140

[16] Ristau D, Gross T. Ion beam sputter coatings for laser technology[C]. SPIE, 5963, 596313(2005).

[17] Lee C C, Tien C L, Hsu J C. Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering[J]. Applied Optics, 41, 2043-2047(2010). http://www.opticsinfobase.org/ao/abstract.cfm?id=68442

[18] Dligatch S, Gross M, Chtanov A. Ultra-low-reflectance, high-uniformity, multilayer-antireflection coatings on large substrates deposited using an ion-beam sputtering system with a customized planetary rotation stage[C]. SPIE, 8168, 816803(2011).