[1] [1] Xu Weicai. Optical Design and Imaging Performance Compensation for the Lithographic Lens[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2011.

[2] [2] Zhao Feifei, Tang Jianyu, Huang Wei, et al.. Computer-aided alignment for the lithographic lens[J]. Acta Optica Sinica, 2014, 34(6): 0622001.

[3] [3] Yang Tianxing, Huang Wei, Shang Hongbo, et al.. Effect of material inhomogeneity on the image quality of optical systems with extremely small aberration[J]. Laser & Optoelectronics Progress, 2013, 50(11): 112202.

[4] [4] K Mann, A Bayer, U Leinhos, et al.. Measurement of wavefront distortions in DUV optics due to lens heating[C]. SPIE, 2011, 7973: 79732B.

[5] [5] J Zhou, Y P Zhang, P Engblom, et al.. Improving aberration control with application specific optimization using computational lithography [C]. SPIE, 2010, 7640: 76400K.

[6] [6] Y Uehara, T Matsuyama, T Nakashima, et al.. Thermal aberration control for lowk1 lithography[C]. SPIE, 2007, 6520: 65202V.

[7] [7] K Fukuhara, A Mimotogi, T Kono, et al.. Solutions with precise prediction for thermal aberration error in low-k1 immersion lithography [C]. SPIE, 2013, 8683: 86830U.

[8] [8] T Nakashima, Y Ohmura, T Ogata, et al.. Thermal aberration control in projection lens[C]. SPIE, 2008, 6924: 69241V.

[9] [9] Y Ohmura, T Ogata, T Hirayama, et al.. An aberration control of projection optics for multi-patterning lithography[C]. SPIE, 2011, 7973: 79730W.

[10] [10] H Sewell, J A McClay, A Guzman, et al.. Aberration control for 70- nm optical lithography[C]. SPIE, 2001, 4404: 279-289.

[11] [11] Zhou Liansheng, Yu Xinfeng, Wu Zhihui, et al.. Analysis of influence factors of thermal aberrations based on the small lens system[J]. Laser & Optoelectronics Progress, 2014, 51(9): 092204.

[12] [12] Chen Hua, Su Dongqi, Sui Yongxin, et al.. Active compensation of thermal aberrations in lithographic projection lens[J]. Acta Optica Sinica, 2014, 34(8): 0811001.

[13] [13] B Kneer, P Grupner, R Garreis, et al.. Catadioptric lens design: The breakthrough to hyper-NA optics[C]. SPIE, 2006, 6154: 615420.

[14] [14] J Dirk. Projection exposure method, projection exposure system and projection objective. United States Patent: US9036129[P]. 2015.