Fig. 1. Schematic of binary collision

Fig. 2. Flow chart of movement calculation of depositing particles

Fig. 3. Schematic of magnetron sputtering atomic deposition

Fig. 4. Cosine of incident angle distributions of Mo and Si atoms. (a)(b) Varying with gas pressure; (c)(d) varying with target-substrate distance

Fig. 5. Incident energy distributions of Mo and Si atoms. (a)(b) Varying with gas pressure; (c)(d) varying with target-substrate distance

Fig. 6. Different surface contours with same roughness value. (a) Low-spatial-frequency; (b) high-spatial-frequency

Fig. 7. Surface contour structures of Mo/Si multilayer coatings measured at different pressures. (a) 0.06 Pa; (b) 0.08 Pa; (c) 0.12 Pa

Fig. 8. Surface roughness of Mo/Si multilayer coatings measured at different gas pressures. (a) Roughness; (b) power spectral density

Fig. 9. Surface contour structures of Mo/Si multilayer coatings measured at different target-substrate distances. (a) 14 cm; (b) 12 cm; (c) 10 cm

Fig. 10. Surface roughness of Mo/Si multilayer coatings measured at different target-substrate distances. (a) Roughness; (b) power spectral density