[1] Bhattacharyya K, Ke C M, Huang G T et al. On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections[J]. Proceedings of SPIE, 8681, 868104(2013).

[2] Nam Y S, Kim S, Shin J H et al. Overlay improvement methods with diffraction based overlay and integrated metrology[J]. Proceedings of SPIE, 9426, 942612(2015).

[3] Lee D, Lee J, Lee E et al. Improved multi-lot overlay performance via phase based ADI overlay measurements[J]. Proceedings of SPIE, 12053, 389-394(2022).

[4] Li Y M, Yang L, Wang X H et al. Overlay metrology for lithography machine[J]. Laser & Optoelectronics Progress, 59, 0922023(2022).

[5] Qiu J, Yang G H, Li J et al. Development and challenges of lithographical alignment technologies[J]. Acta Optica Sinica, 43, 1900001(2023).

[6] Leray P, Jehoul C, Socha R et al. Improving scanner wafer alignment performance by target optimization[EB/OL]. https:∥ui.adsabs.harvard.edu/abs/2016SPIE.9778E.2ML/abstract?bbbRedirect=1

[7] Leray P. Metrology challenges for in-line process control[J]. Proceedings of SPIE, 10145, 1014503(2017).

[8] Kim Y S, Hwang Y S, Jung M R et al. Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets[J]. Proceedings of SPIE, 9424, 942414(2015).

[9] Shin J, Chalykh R, Kang H et al. Overlay metrology for dark hard mask process: simulation and experiment study[J]. Proceedings of SPIE, 6518, 65182U(2007).

[10] Yun S, Ha S M, Nam Y M et al. A comparison of alignment and overlay performance with varying hardmask materials[J]. Proceedings of SPIE, 8324, 832407(2012).

[11] Menchtchikov B, Socha R, Raghunathan S et al. Computational scanner wafer mark alignment[J]. Proceedings of SPIE, 10417, 104171C(2017).

[12] Menchtchikov B, Socha R, Zheng C M et al. Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models[J]. Proceedings of SPIE, 10587, 105870C(2018).

[13] Zhou G Y, Qi Y J, Li L et al. Robustness analysis method and simulation research of alignment mark[J]. Acta Optica Sinica, 43, 1113002(2023).

[14] Du J Y, Dai F Z, Wang X Z. Calibration method for alignment error caused by asymmetric deformation of mark and its application in overlay measurement[J]. Chinese Journal of Lasers, 46, 0704004(2019).

[15] Du J Y, Dai F Z, Bu Y et al. Calibration method of overlay measurement error caused by asymmetric mark[J]. Applied Optics, 57, 9814-9821(2018).

[16] Yuan W, Zhu Y, Zhang M et al. Design of two-dimensional metrological planar grating[J]. Acta Optica Sinica, 43, 1905001(2023).

[17] Kim J H E, Chrostowski L, Bisaillon E et al. DBR, sub-wavelength grating, and photonic crystal slab Fabry-Perot cavity design using phase analysis by FDTD[J]. Optics Express, 15, 10330-10339(2007).

[18] Liang T L, Shao W, Shi S B et al. Analysis of extraordinary optical transmission with periodic metallic gratings using ADE-LOD-FDTD method[J]. IEEE Photonics Journal, 8, 7804710(2016).

[19] Hoshino T, Banerjee S, Itoh M et al. Design of a wavelength independent grating in the resonance domain[J]. Applied Optics, 46, 7942-7956(2007).

[20] Arasu P T, Al-Qazwini Y, Onn B I et al. Fiber Bragg grating based surface plasmon resonance sensor utilizing FDTD for alcohol detection applications[C], 93-97(2012).

[21] Chen T Y, Zhou Y Y, Gao A. Research on wafer stage overlay-μDBO targets by lithography imaging simulation software[J]. Journal of Tsinghua University (Science and Technology), 63, 2057-2075(2023).

[22] Dettoni F, Bouyssou R, Dezauzier C et al. Enhanced 28 nm FD-SOI diffraction based overlay metrology based on holistic metrology qualification[J]. Proceedings of SPIE, 10145, 101452B(2017).

[23] Bhattacharyya K, den Boef A, Noot M et al. A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection[J]. Proceedings of SPIE, 10145, 101450A(2017).

[24] Zou K H, Tuncali K, Silverman S G. Correlation and simple linear regression[J]. Radiology, 227, 617-622(2003).