Fig. 1. Schematic diagram of angle-resolved scatterometer

Fig. 2. Flow chart of diffraction efficiency calculation

Fig. 3. Schematic diagram of pupil sampling

Fig. 4. Schematic diagram of polarization direction projection on xoy plane

Fig. 5. Schematic diagram of each vector in xoy plane

Fig. 6. Flowchart of RCWA calculation

Fig. 7. Schematic diagrams of example overlay marks. (a) Main view of LOL structure; (b) top view of LOL structure; (c) main view of LOT structure; (d) top view of LOT structure

Fig. 8. Simulation results of diffraction signals of LOL structure markers under conditions of incident light wavelength of 630 nm and TM polarization

Fig. 9. Curves of performance parameters of overlay marks under different conditions as functions of incident light wavelength. (a) D_E; (b) K; (c) S_S

Fig. 10. Curves of δOVL under different conditions as functions of incident light wavelength

Fig. 11. Comparison of K, S_S, and δOVL under different conditions. (a) K; (b) S_S; (c) δOVL

Fig. 12. Variation curves of ±1-order intensity differences with overlay error under 480 nm incident light conditions. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization

Fig. 13. Variation curves of ±1-order intensity differences with overlay error under 600 nm incident light conditions. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization

Fig. 14. Schematic diagrams of BMW aperture. (a) Schematic diagram of aperture shape; (b) schematic diagram of pupil sampling

Fig. 15. Comparison of K, S_S,and δOVL under different conditions for BMW aperture