Fig. 1. Schematic of the double-sided photolithography based on computer-generated holography algorithm

Fig. 2. Schematic of the optical path of the improved GS algorithm

Fig. 3. Flow chart of iterative optimization of improved GS algorithm

Fig. 4. Reconstructed images of light field at different depths in the target volume calculated by simulation. (a) Letter B; (b) letter A

Fig. 5. Simulated images of two-layer image plane in the presence of crosstalk. (a) Letter B; (b) letter A

Fig. 6. Diagram of experimental system of double-sided photolithography based on computer-generated holography algorithm

Fig. 7. Image plane without eliminating speckle and stray light. (a) Image plane in the presence of speckle; (b) image plane in the presence of stray light

Fig. 8. Image planes observed by the camera at different positions. (a) Image plane B; (b) image plane A

Fig. 9. Exposure results of photosensitive resin. (a) Exposure result of the front surface of the substrate; (b) exposure result of the posterior surface of the substrate

Fig. 10. Results after exposure and development of photoresist. (a) High diffraction order exposure on the front surface of the substrate;(b) zero order exposure on the posterior surface of the substrate