Holographic Double-Sided Photolithography Based on Improved Gerchberg-Saxton Algorithm

Huabin Wang; Yu He; Lixin Zhao

doi:10.3788/LOP222978

Laser & Optoelectronics Progress, Volume. 60, Issue 16, 1609001(2023)

Holographic Double-Sided Photolithography Based on Improved Gerchberg-Saxton Algorithm

Huabin Wang^1,2, Yu He^1,2, and Lixin Zhao^1,2、*

¹State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, Sichuan, China

²University of Chinese Academy of Sciences, Beijing 100049, China

show less

Abstract Get PDF(in Chinese)

Cited By

Article index updated: Sep. 9, 2025

The article is cited by 4 article(s) CLP online library. (Some content might be in Chinese.)

Tools

Get Citation

Copy Citation Text

Huabin Wang, Yu He, Lixin Zhao. Holographic Double-Sided Photolithography Based on Improved Gerchberg-Saxton Algorithm[J]. Laser & Optoelectronics Progress, 2023, 60(16): 1609001

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Holography

Received: Nov. 7, 2022

Accepted: Jan. 17, 2023

Published Online: Aug. 15, 2023

The Author Email: Lixin Zhao (lixinzhao@sohu.com)

DOI:10.3788/LOP222978

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology