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Chinese Journal of Lasers, Volume. 42, Issue 3, 303012(2015)

Research on Excimer Laser Etching Technology for Achieving Optical Waveguide End Face

Jia Nana1,2、*, Deng Chuanlu1,2, Pang Fufei1,2, Gu Xin1,2, and Wang Tingyun1,2
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    Article index updated: Mar. 10, 2025

    The article is cited by 6 article(s) CLP online library. (Some content might be in Chinese.)
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    Jia Nana, Deng Chuanlu, Pang Fufei, Gu Xin, Wang Tingyun. Research on Excimer Laser Etching Technology for Achieving Optical Waveguide End Face[J]. Chinese Journal of Lasers, 2015, 42(3): 303012

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    Paper Information

    Category: laser manufacturing

    Received: Oct. 14, 2014

    Accepted: --

    Published Online: Feb. 3, 2015

    The Author Email: Nana Jia (18817872809@163.com)

    DOI:10.3788/cjl201542.0303012

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology