High Power Laser and Particle Beams, Volume. 35, Issue 11, 111005(2023)

Improving laser damage resistance of fused silica by organic fluoric acid etching

Fangting Chi, Xiaoyu Li, Yuanli Li, Lina Lü, Hao Peng, and Zhiyuan Du
Author Affiliations
  • Innovation Center for Nuclear Environmental Safety, Southwest University of Science and Technology, Mianyang 621010, China
  • show less
    Figures & Tables(7)
    Schematic diagram of organic fluoric acid statically etched fused silica optics
    Etching rate of organic fluoric acid on fused silica optics
    Dark field images of fused silica after etching
    Optical microscope images of fused silica after etching
    Optical microscope images of scratches on the fused silica surface
    Transmittance spectra of fused silica
    Laser damage of fused silica
    Tools

    Get Citation

    Copy Citation Text

    Fangting Chi, Xiaoyu Li, Yuanli Li, Lina Lü, Hao Peng, Zhiyuan Du. Improving laser damage resistance of fused silica by organic fluoric acid etching[J]. High Power Laser and Particle Beams, 2023, 35(11): 111005

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: May. 14, 2023

    Accepted: Sep. 27, 2023

    Published Online: Dec. 26, 2023

    The Author Email:

    DOI:10.11884/HPLPB202335.230131

    Topics