Chinese Journal of Lasers, Volume. 48, Issue 2, 0202019(2021)

Research Advancement on Ultrafast Laser Microprocessing of Transparent Dielectrics

Jiaqun Li1, Jianfeng Yan1、*, Xin Li2, and Liangti Qu1,3
Author Affiliations
  • 1Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
  • 2School of Mechanical Engineering, Beijing Institute of Technology, Beijing, 100081, China
  • 3Department of Chemistry, Tsinghua University, Beijing 100084, China
  • show less
    Figures & Tables(11)
    Mechanisms, phenomena and applications of ultrafast laser processing of transparent dielectrics
    Interaction between ultrafast laser and transparent dielectrics. (a) Diagram of ultrafast laser irradiation inside transparent dielectrics; (b) electron ionization process in transparent dielectrics; (c) structural changes in transparent dielectrics induced by ultra-fast laser with different fluxes
    Three structural changes in transparent dielectrics induced by ultrafast laser. (a) Schematic of refractive index change induced by ultrafast laser; (b) waveguide structure directly written via ultrafast laser induced refractive index change[19]; (c) diagram of nanograting structures induced by ultrafast laser; (d) back-scattered electron images of nanograting structures[20]; (e) diagram of nanovo
    Mechanism of ultrafast laser induced structural changes in transparent dielectrics. (a) Structural change of SiO2 induced by laser irradiation; (b) simple model of nanograting structure; (c) dual plasmon decay model[39]; (d) self-trapping exciton and semi-permanent point defect formation process[40]
    Waveguide devices directly written by ultrafast laser. (a) Embedded waveguide structure directly written by femtosecond laser pulse [57]; (b) depressed cladding waveguide structure processed by femtosecond laser[58]
    Diffraction optical elements prepared by ultrafast laser. (a) Microlens prepared by femtosecond laser pulse train irradiating of fused silica substrate[60]; (b) geometric phase prisms and lens prepared by femtosecond laser[62]
    Method for preparing micro-hole and microchannel with ultrafast laser. (a) Direct laser ablation; (b) laser induced backside wet etching; (c) laser assisted chemical wet etching
    Micro-holes and microchannels processed by ultrafast laser. (a) Micro-channel processing results by Bessel-like beam(length scale bar is 100μm, and diameter scale bar is 2μm)[55]; (b) micro-hole processing results by temporal Airy beam and temporally broadened beam[63]; (c) annular micro-channel structures processed by femtosecond laser before and after compensation of spherical aberration effect<
    Micro-holes and microchannels processed by ultrafast laser in our research group. (a) Enhancement of ablation depth by femtosecond laser double pulses (scale bar is 100μm); (b) micro-channel processed by single Bessel pulse (scale bar is 10μm); (c) micro-channel processed by laser induced backside wet etching in borosilica glass (scale bar is 40μm)
    Distributions of micro-channel diameter and length [66-78]
    • Table 1. Refractive index changes induced by ultrafast laser in different transparent dielectrics

      View table

      Table 1. Refractive index changes induced by ultrafast laser in different transparent dielectrics

      MaterialLaser treatmentRefractive indexReference
      Ge-doped silica glassfs laser with wavelength of 800nm, pulse durationof 120fs and repetition rate of 200kHz0.01--0.035[19]
      Corning 0211 glassfs laser with pulse energy of 5nJ and NA of 1.43×10-4[23]
      Corning 7890 glassfs laserAbout 0.0045[27]
      Standard fiberfs laser with wavelength of 800nm and pulse durationof 120fs6×10-3[28]
      Silica glassfs laserAbout 3×10-4[22]
      Silica glassfs laser with pulse duration of 130fs and repetitionrate of 1kHz8×10-3[29]
      IOG-1 glassfs laser with pulse duration of 130fs and wavelengthof 800nm-1.4×10-4[24]
      BK7 glassfs laserAbout -0.004±0.0001[25]
      Lithium-borosilicate glassfs laserAbout -0.0003±0.0002[25]
      Schott glass 8261fs laserAbout 0.003±0.0002[25]
      Alkali-aluminum-silicateglassfs laserAbout 0.0004(edge)and about -0.0012±0.0002(center)[25]
      LAS glassfs laserAbout 1.5×10-3[25]
      Lead-silicate glass SF57fs laserAbout 0.003±0.0002[25]
      Corning glassfs laser (Bessel beam)Non-uniform[26]
    Tools

    Get Citation

    Copy Citation Text

    Jiaqun Li, Jianfeng Yan, Xin Li, Liangti Qu. Research Advancement on Ultrafast Laser Microprocessing of Transparent Dielectrics[J]. Chinese Journal of Lasers, 2021, 48(2): 0202019

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: laser manufacturing

    Received: Aug. 24, 2020

    Accepted: Oct. 14, 2020

    Published Online: Jan. 7, 2021

    The Author Email: Yan Jianfeng (yanjianfeng@tsinghua.edu.cn)

    DOI:10.3788/CJL202148.0202019

    Topics