Simulation Techniques for Directed Self-Assembly Lithography: An Overview

Haolan Wang; Tao Zhang; Shisheng Xiong; Sikun Li

doi:10.3788/CJL231536

Chinese Journal of Lasers, Volume. 51, Issue 11, 1101033(2024)

Simulation Techniques for Directed Self-Assembly Lithography: An Overview

Haolan Wang^1,2, Tao Zhang^1,2, Shisheng Xiong³, and Sikun Li^1,2、*

¹Department of Advanced Optical and Microelectronic Equipment, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²University of Chinese Academy of Sciences, Beijing 100049, China

³Zhangjiang Laboratory, Shanghai 201210, China

show less

Abstract Get PDF(in Chinese)

References(100)

[1] Erdmann A[M]. Optical and EUV lithography: a modeling perspective, 1-4(2023).

[2] Otto O W, Garofalo J G, Low K K et al. Automated optical proximity correction: a rules-based approach[J]. Proceedings of SPIE, 2197, 278-293(1994).

[3] Chou D, McAllister K. Line end optimization through optical proximity correction (OPC): a case study[J]. Proceedings of SPIE, 6154, 61543A(2006).

[4] Pati Y C, Kailath T. Phase-shifting masks for microlithography: automated design and mask requirements[J]. Journal of the Optical Society of America A, 11, 2438-2452(1994).

[5] Levenson M D, Viswanathan N S, Simpson R A. Improving resolution in photolithography with a phase-shifting mask[J]. IEEE Transactions on Electron Devices, 29, 1828-1836(1982).

[6] Liao L F, Li S K, Zhang Z N et al. Research on source and mask optimization[J]. Laser & Optoelectronics Progress, 59, 0922010(2022).

[7] Li S K, Wang X Z, Bu Y. Robust pixel-based source and mask optimization for inverse lithography[J]. Optics & Laser Technology, 45, 285-293(2013).

[8] Abrams D S, Pang L Y. Fast inverse lithography technology[J]. Proceedings of SPIE, 6154, 61541J(2006).

[9] Owa S, Wakamoto S, Murayama M et al. Immersion lithography extension to sub-10 nm nodes with multiple patterning[J]. Proceedings of SPIE, 9052, 90520O(2014).

[10] Xu X B, Yang Q, Wattanatorn N et al. Multiple-patterning nanosphere lithography for fabricating periodic three-dimensional hierarchical nanostructures[J]. ACS Nano, 11, 10384-10391(2017).

[11] Hu X H, Xiong S S. Advanced lithography: directed self-assembly[J]. Chinese Journal of Applied Chemistry, 38, 1029-1078(2021).

[12] Li Z L, Hu X H, Xiong S S. DSA in combination with DUV lithography for sub-10 nm manufacturing[J]. Laser & Optoelectronics Progress, 59, 0922027(2022).

[13] Chou S Y, Krauss P R, Renstrom P J. Nanoimprint lithography[J]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, 14, 4129-4133(1996).

[14] Guo L J. Nanoimprint lithography: methods and material requirements[J]. Advanced Materials, 19, 495-513(2007).

[15] Traub M C, Longsine W, Truskett V N. Advances in nanoimprint lithography[J]. Annual Review of Chemical and Biomolecular Engineering, 7, 583-604(2016).

[17] Pease R F W. Electron beam lithography[J]. Contemporary Physics, 22, 265-290(1981).

[18] Chang T H P, Mankos M, Lee K Y et al. Multiple electron-beam lithography[J]. Microelectronic Engineering, 57/58, 117-135(2001).

[19] Vieu C, Carcenac F, Pépin A et al. Electron beam lithography: resolution limits and applications[J]. Applied Surface Science, 164, 111-117(2000).

[20] Hutcheson G D. E-beam direct write: why it’s always left standing at the altar of new nodes[J]. Proceedings of SPIE, 10584, 105840F(2018).

[21] Lu C, Lipson R H. Interference lithography: a powerful tool for fabricating periodic structures[J]. Laser & Photonics Reviews, 4, 568-580(2010).

[22] Xie Q, Hong M H, Tan H L et al. Fabrication of nanostructures with laser interference lithography[J]. Journal of Alloys and Compounds, 449, 261-264(2008).

[23] Jang J H, Ullal C K, Maldovan M et al. 3D micro- and nanostructures via interference lithography[J]. Advanced Functional Materials, 17, 3027-3041(2007).

[24] Wahl M, Michelmann J, Sailer H et al. Advanced patterning strategies for maskless laser direct write lithography[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Advanced-patterning-strategies-for-maskless-laser-direct-write-lithography/12956-28#_=_

[25] Grushina A. Direct-write grayscale lithography[J]. Advanced Optical Technologies, 8, 163-169(2019).

[26] Schuster C, Heinrich M, Voigt A et al. Challenges of photomask-based greyscale lithography with a highly sensitive positive photoresist designed for >100 µm deep greyscale patterns[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Challenges-of-photomask-based-greyscale-ithography- with-a-highly-sensitive/12956-48#_=_

[27] Danylyuk S, Deuter V, Grochowicz M et al. Holographic masks for computational proximity lithography with EUV radiation[J]. Proceedings of SPIE, 10809, 108091A(2018).

[28] Deuter V, Grochowicz M, Brose S et al. Computational proximity lithography with extreme ultraviolet radiation[J]. Optics Express, 28, 27000-27012(2020).

[30] Cheng J Y, Sanders D P, Truong H D et al. Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist[J]. ACS Nano, 4, 4815-4823(2010).

[31] Park S M, Stoykovich M P, Ruiz R et al. Directed assembly of lamellae- forming block copolymers by using chemically and topographically patterned substrates[J]. Advanced Materials, 19, 607-611(2007).

[32] Gronheid R, Singh A, Younkin T R et al. Rectification of EUV-patterned contact holes using directed self-assembly[J]. Proceedings of SPIE, 8682, 86820A(2013).

[33] Singh G. Continuing Moore’s law with next-gen DSA[J]. Proceedings of SPIE(2023).

[34] Singh G. Low variability metal pitch scaling with directed self-assembly[J]. Proceedings of SPIE, 12054, PC1205401(2022).

[35] Li L Y, Li W H. Recent progress in the study of the self-assembly of ABC block terpolymers[J]. Scientia Sinica (Chimica), 53, 651-663(2023).

[36] Hu H Q, Gopinadhan M, Osuji C O. Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter[J]. Soft Matter, 10, 3867-3889(2014).

[37] Jin X S, Pang Y Y, Ji S X. From self-assembled monolayers to chemically patterned brushes: controlling the orientation of block copolymer domains in films by substrate modification[J]. Chinese Journal of Polymer Science, 34, 659-678(2016).

[38] Stoykovich M P, Kang H M, Daoulas K C et al. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries[J]. ACS Nano, 1, 168-175(2007).

[39] Yang J K W, Jung Y S, Chang J B et al. Complex self-assembled patterns using sparse commensurate templates with locally varying motifs[J]. Nature Nanotechnology, 5, 256-260(2010).

[40] Ginzburg V V, Weinhold J D, Hustad P D et al. Modeling chemoepitaxy of block copolymer thin films using self-consistent field theory[J]. Journal of Photopolymer Science and Technology, 26, 817-823(2013).

[41] Delgadillo P A R, Gronheid R, Thode C J et al. Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment[J]. Journal of Micro/Nanolithography, 11, 031302(2012).

[42] Suh H S, Dudash V, Lorusso G et al. Roughness study on line and space patterning with chemo-epitaxy directed self-assembly[J]. Proceedings of SPIE, 11326, 113260X(2020).

[43] Li J J, Rincon-Delgadillo P A, Suh H S et al. Kinetic approach to defect reduction in directed self-assembly[J]. Journal of Micro/Nanolithography, 18, 043502(2019).

[44] Delgadillo P R, Harukawa R, Suri M et al. Defect source analysis of directed self-assembly process (DSA of DSA)[J]. Proceedings of SPIE, 8680, 86800L(2013).

[45] Yi H, Bao X Y, Zhang J et al. Flexible control of block copolymer directed self-assembly using small, topographical templates: potential lithography solution for integrated circuit contact hole patterning[J]. Advanced Materials, 24, 3107-3114, 3082(2012).

[46] Suh H S, Verstraete L, van Bel J et al. Exploring the synergy between EUV lithography and directed self-assembly[J]. Proceedings of SPIE, 12054, PC1205402(2022).

[47] van Bel J, Verstraete L, Suh H S et al. EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity study[J]. Proceedings of SPIE, 12497, 124970K(2023).

[48] Han E, Singh G, Mahdi T et al. DSA materials and processes development for ≤P24 EUV resist L/S pattern rectification[EB/OL]. https:∥spie.org/advanced-lithography/presentation/DSA-materials-and-processes-development-for--P24-EUV-resist/12956-37#_=_

[49] Gorman K, Montgomery W, Alperson B et al. Directed self-assembly: PS-b-PMMA materials readiness and high-chi platforms for extended geometry scaling[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Directed-Self-Assembly--PS-b-PMMA-materials-readiness-and/12956-38#_=_

[50] Verstraete L, Suh H S, van Bel J et al. Material and process optimization for EUV pattern rectification by directed self-assembly[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Material-and-process-optimization-for-EUV-pattern-rectification-by-directed/12956-39#_=_

[51] Muramatsu M, Nishi T, Ito K et al. Process performance and scalability of DSA hole for DRAM[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Process-performance-and-scalability-of-DSA-hole-for-DRAM/12956-40#_=_

[52] Mack C A, Singh G, Gstrein F. Modeling edge placement error performance of EUV and DSA multipatterning processes[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Modeling-edge-placement-error-performance-of-EUV-and-DSA-multipatterning/12953-17#_=_

[53] Singh G, Nair N, Gstrein F et al. Directed self-assembly enhanced EUV multi-patterning for low variability metal pitch scaling[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Directed-self-assembly-enhanced-EUV-multi-patterning-for-low-variability/12953-16#_=_

[54] Karim A, Sharma K, Basha K et al. Ionic-liquid mediated directed self-assembly of diblock/triblock copolymer thin films for sub-20 nm lithography[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Ionic-liquid-mediated-directed-self-assembly-of-diblock-triblock-copolymer/12956-36#_=_

[55] Wang S B, Zhang Y X, Hou J C et al. Layout simulation for directed self-assembly with chemo-epitaxy methodology[EB/OL]. https:∥spie.org/advanced-lithography/presentation/Layout-simulation-for-directed-self-assembly-with-chemo-epitaxy-methodology/12954-30#_=_

[56] Li J J, Rincon-Delgadillo P A, Suh H S et al. Understanding kinetics of defect annihilation in chemoepitaxy-directed self-assembly[J]. ACS Applied Materials & Interfaces, 13, 25357-25364(2021).

[57] Muramatsu M, Nishi T, Ido Y et al. Defect mitigation of chemo-epitaxy DSA patterns[J]. Proceedings of SPIE, 11326, 113260Y(2020).

[58] Pathangi H, Chan B T, Bayana H et al. Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow[J]. Journal of Micro/Nanolithography, 14, 031204(2015).

[59] Shim S, Chung W, Shin Y. Defect probability of directed self-assembly lithography: fast identification and post-placement optimization[C], 404-409(2015).

[60] Chen G D, Zhang Z N, Li S K et al. Study on deep ultraviolet computational lithography techniques[J]. Laser & Optoelectronics Progress, 59, 0922007(2022).

[61] Shi W J, Yu Z Q, Jiang J H et al. Computational lithography technology under chip manufacture context[J]. Laser & Optoelectronics Progress, 59, 0922001(2022).

[62] Ma X, Zhang S E, Pan Y H et al. Research and progress of computational lithography[J]. Laser & Optoelectronics Progress, 59, 0922008(2022).

[63] Pitera J. Directed sef assembly: computer modeling[EB/OL]. https:∥lithoworkshop.org/

[64] Lawson R A, Peters A J, Ludovice P J et al. Coarse grained molecular dynamics model of block copolymer directed self-assembly[J]. Proceedings of SPIE, 8680, 86801Y(2013).

[65] Huang H J, Alexander-Katz A. Dissipative particle dynamics for directed self-assembly of block copolymers[J]. The Journal of Chemical Physics, 151, 154905(2019).

[66] Fredrickson G H. Dynamics and rheology of inhomogeneous polymeric fluids: a complex Langevin approach[J]. The Journal of Chemical Physics, 117, 6810-6820(2002).

[67] Detcheverry F A, Kang H M, Daoulas K C et al. Monte Carlo simulations of a coarse grain model for block copolymers and nanocomposites[J]. Macromolecules, 41, 4989-5001(2008).

[68] Bosse A W, García-Cervera C J, Fredrickson G H. Microdomain ordering in laterally confined block copolymer thin films[J]. Macromolecules, 40, 9570-9581(2007).

[69] Mitra J, Torres A, Ma Y S et al. Model-based guiding pattern synthesis for on-target and robust assembly of via and contact layers using DSA[J]. Proceedings of SPIE, 10144, 1014414(2017).

[70] Wang W L, Latypov A, Zou Y et al. A full-chip DSA correction framework[J]. Proceedings of SPIE, 9049, 90491J(2014).

[71] Fühner T, Michalak P, Wu X F et al. Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach[C], 133-136(2016).

[72] Latypov A, Coskun T H. DSA-aware assist features[J]. Proceedings of SPIE, 9423, 94231G(2015).

[73] Ma Y S, Torres J A, Fenger G et al. Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications[J]. Proceedings of SPIE, 9231, 92310T(2014).

[74] Hur S M, García-Cervera C J, Kramer E J et al. SCFT simulations of thin film blends of block copolymer and homopolymer laterally confined in a square well[J]. Macromolecules, 42, 5861-5872(2009).

[75] Huang C H, Zhu Y Y, Man X K. Block copolymer thin films[J]. Physics Reports, 932, 1-36(2021).

[76] Rasmussen K Ø, Kalosakas G. Improved numerical algorithm for exploring block copolymer mesophases[J]. Journal of Polymer Science Part B: Polymer Physics, 40, 1777-1783(2002).

[77] Ceniceros H D, Fredrickson G H. Numerical solution of polymer self-consistent field theory[J]. Multiscale Modeling & Simulation, 2, 452-474(2004).

[78] Fredrickson G H[M]. The equilibrium theory of inhomogeneous polymers(2006).

[79] Li W H, Qiu F, Shi A C. Emergence and stability of helical superstructures in ABC triblock copolymers[J]. Macromolecules, 45, 503-509(2012).

[80] Takahashi H, Laachi N, Delaney K T et al. Defectivity in laterally confined lamella-forming diblock copolymers: thermodynamic and kinetic aspects[J]. Macromolecules, 45, 6253-6265(2012).

[81] Kim S O, Solak H H, Stoykovich M P et al. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates[J]. Nature, 424, 411-414(2003).

[82] Iwama T, Laachi N, Delaney K T et al. Field-theoretic simulations of directed self-assembly for contact multiplication[J]. Journal of Photopolymer Science and Technology, 28, 689-693(2015).

[83] Laachi N, Iwama T, Delaney K T et al. Field-theoretic simulations of multi-cylinder configurations in VIA lithography[J]. Journal of Photopolymer Science and Technology, 27, 21-24(2014).

[84] Laachi N, Delaney K T, Kim B et al. Self-consistent field theory investigation of directed self-assembly in cylindrical confinement[J]. Journal of Polymer Science Part B: Polymer Physics, 53, 142-153(2015).

[85] Yoshimoto K, Peters B L, Khaira G S et al. Scalable simulations for directed self-assembly patterning with the use of GPU parallel computing[J]. Proceedings of SPIE, 8323, 83232P(2012).

[86] Latypov A, Coskun T H, Garner G et al. Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends[J]. Proceedings of SPIE, 9049, 904908(2014).

[87] Peters B L, Rathsack B, Somervell M et al. Graphoepitaxial assembly of cylinder forming block copolymers in cylindrical holes[J]. Journal of Polymer Science Part B: Polymer Physics, 53, 430-441(2015).

[88] Detcheverry F A, Pike D Q, Nealey P F et al. Simulations of theoretically informed coarse grain models of polymeric systems[J]. Faraday Discussions, 144, 111-125(2010).

[89] Liu C C, Ramírez-Hernández A, Han E et al. Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features[J]. Macromolecules, 46, 1415-1424(2013).

[90] Delony J B, Ludovice P J, Henderson C L. Block copolymer directed self-assembly defect modes induced by localized errors in chemoepitaxial guiding underlayers: a molecular simulation study[J]. Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures, 38, 032604(2020).

[91] Delony J B, Ludovice P J, Henderson C L. Understanding and mitigating bridge defects in block copolymer directed self-assembly through computational materials design and optimization[J]. Proceedings of SPIE, 11326, 113261K(2020).

[92] Nakano T, Matsukuma M, Matsuzaki K et al. Dissipative particle dynamics study on directed self-assembly in holes[J]. Proceedings of SPIE, 8680, 86801J(2013).

[93] Groot R D, Madden T J. Dynamic simulation of diblock copolymer microphase separation[J]. The Journal of Chemical Physics, 108, 8713-8724(1998).

[94] Muramatsu M, Nakano T, Tomita T et al. Simulation analysis of directed self-assembly for hole multiplication in guide pattern[J]. Proceedings of SPIE, 9049, 904921(2014).

[95] Liu C C, Pitera J, Lafferty N et al. Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy[J]. Proceedings of SPIE, 8323, 83230X(2012).

[96] Yoshimoto K, Taniguchi T. Large-scale dynamics of directed self-assembly defects on chemically pre-patterned surface[J]. Proceedings of SPIE, 8680, 86801I(2013).

[97] Yoshimoto K, Fukawatase K, Ohshima M et al. Optimization of directed self-assembly hole shrink process with simplified model[J]. Journal of Micro/Nanolithography, 13, 031305(2014).

[98] Torres J A, Sakajiri K, Fryer D et al. Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes[J]. Proceedings of SPIE, 9053, 90530R(2014).

[99] Fenger G, Burbine A, Torres J A et al. Calibration and application of a DSA compact model for graphoepitaxy hole processes using contour-based metrology[J]. Proceedings of SPIE, 9235, 92351X(2014).

[100] Fenger G, Torres J A, Ma Y S et al. Compact model experimental validation for grapho-epitaxy hole processes and its impact in mask making tolerances[J]. Proceedings of SPIE, 9231, 92310Q(2014).

[101] Edwards E W, Montague M F, Solak H H et al. Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates[J]. Advanced Materials, 16, 1315-1319(2004).

[102] Hill J D, Millett P C. Numerical simulations of directed self-assembly in diblock copolymer films using zone annealing and pattern templating[J]. Scientific Reports, 7, 5250(2017).

Tools

Get Citation

Copy Citation Text

Haolan Wang, Tao Zhang, Shisheng Xiong, Sikun Li. Simulation Techniques for Directed Self-Assembly Lithography: An Overview[J]. Chinese Journal of Lasers, 2024, 51(11): 1101033

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: laser devices and laser physics

Received: Dec. 6, 2023

Accepted: Mar. 18, 2024

Published Online: May. 30, 2024

The Author Email: Li Sikun (lisikun@siom.ac.cn)

DOI:10.3788/CJL231536

CSTR:32183.14.CJL231536

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology