Fig. 1. Schematic illustration of microstructures of diblock copolymer on different volume fractions of A block

Fig. 2. Functions of DSA lithography. (a) Lines and spaces pattern multiplication^[40]; (b) hole pattern shrinking and multiplication^[45]; (c) EUV pattern rectification^[46]

Fig. 3. Currently implemented DSA models and simulation methods^[63]

Fig. 4. Illustration of Hamiltonian as a function of field W in a one-dimensional setting

Fig. 5. Diverse equilibrium structures resulting from different initial conditions under the same set of parameters

Fig. 6. Two types of defects in self-assembled lamellae: dislocation (left) and disclination (right)^[80]

Fig. 7. Top view of elongated template

Fig. 8. PMMA density profile in elongated templates, simulated by SCFT^[82]. (a) Perfect structure in PMMA template; (b) perfect structure in neutral template; (c) perfect structure in mix template; (d) defect structure in PMMA template; (e) defect structure in neutral template; (f) defect structure in mix template

Fig. 9. The equilibrium 3D-structures predicted by SCFT. (a) Perfect state in PS mix template; (b) defect states in PS templates

Fig. 10. Different directed self-assembled structures in elongated templates obtained under increasing template length

Fig. 11. 3D-structures resulting from varying separation strengths χN and guiding templates critical dimension in PMMA attractive templates^[84]

Fig. 12. Schematics of cloud-density technique and particle-to-mesh (PM) technique. (a) Cloud-density technique where particles only contribute to the density in the vicinity; (b) PM technique where simulation space is discretized into grid points at which density is computed, the contributions yield by each particle to a certain node is dependent on the distance between them

Fig. 13. Blend system of copolymer and homopolymer over a substrate patterned with stripes bent at right angle^[67]. (a) Top-down SEM image of the experimental system; (b) simulation result, where A and B domains are shown in red and blue, respectively

Fig. 14. Simulation flow (left) of parallel computing Monte Carlo approach with a schematic of non-interactive grids (right)^[85]

Fig. 15. Monte Carlo simulation results of hole shrinking^[86]. (a) Top-down view of minority block; (b) top-down view of majority block

Fig. 16. Initial (left) and equilibrium (right) state of Monte Carlo simulation for lamella-forming symmetric diblock copolymer

Fig. 17. Monte Carlo simulation results of stripe pattern multiplication^[88]. (a) Substrate chemical pattern with a period of 2L₀ (The substrate has a PS-attractive background, colored in yellow, and is filled with PMMA-attractive stripes with a width of W, colored in blue); (b) the guiding template is coated with diblock copolymer material with a thickness of L_z; (c) microdomain morphologies seen in simulations

Fig. 18. Top-down SEM images and 3D images of corresponding simulations^[89]

Fig. 19. Simulation results of molecular dynamics model: top-down images of the time evolution of the directed self-assembled pattern^[64]

Fig. 20. Description of the three potentials experienced by each coarse-grain particle in the molecular dynamics model^[64]

Fig. 21. Bridge defect in stripe pattern^[91]

Fig. 22. Simulation results of DPD model^[92,94]

Fig. 23. A design flow for photomask with integration of optical proximity correction and DSA simulation^[95]