Chinese Journal of Lasers, Volume. 37, Issue 8, 2051(2010)

Impact of Evaporation Characteristics of SiO2 on Uniformity of Thin-Film Thickness

Wang Ning1,2、*, Shao Jianda1, Yi Kui1, and Wei Chaoyang1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    Wang Ning, Shao Jianda, Yi Kui, Wei Chaoyang. Impact of Evaporation Characteristics of SiO2 on Uniformity of Thin-Film Thickness[J]. Chinese Journal of Lasers, 2010, 37(8): 2051

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: materials and thin films

    Received: Nov. 18, 2009

    Accepted: --

    Published Online: Aug. 13, 2010

    The Author Email: Ning Wang (shumangy@126.com)

    DOI:10.3788/cjl20103708.2051

    Topics