Chinese Journal of Lasers, Volume. 37, Issue 8, 2051(2010)
Impact of Evaporation Characteristics of SiO2 on Uniformity of Thin-Film Thickness
Get Citation
Copy Citation Text
Wang Ning, Shao Jianda, Yi Kui, Wei Chaoyang. Impact of Evaporation Characteristics of SiO2 on Uniformity of Thin-Film Thickness[J]. Chinese Journal of Lasers, 2010, 37(8): 2051
Category: materials and thin films
Received: Nov. 18, 2009
Accepted: --
Published Online: Aug. 13, 2010
The Author Email: Ning Wang (shumangy@126.com)