[1] [1] Jellison G E. Handbook of ellipsometry［M］. Plenum Publishing Corporation,2005.

[2] [2] Folks W R, Ginn J, Shelton D, et al. Spectroscopic ellipsometry of materials for infrared micro-device fabrication［J］. Physica Status Solidi,2008,5(5):1113—1116.

[4] [4] Schubert M, Rheinlander B, Franke E, et al. Infrared optical properties of mixed phase thin films studied by spectroscopic ellipsometry using boron nitride as an example［J］. Physical Review B Condensed Matter,1997,56(20):13306—13313.

[5] [5] Drude P. Ueber die gesetze der reflexion und brechung des lichtes an der grenze absorbirender krystalle［J］. Annalen Der Physik,1887,268(12):584—625.

[6] [6] Stobie R W, Rao B, Dignam M J. Automatic ellipsometer with high sensitivity and special advantages for infrared spectroscopy of adsorbed species［J］. Appl. Opt,1975,14(4):999.

[8] [8] Chen L Y, Feng X W, Ma H Z. Improved rotating analyzer-polarizer type of scanning ellipsometer［J］. Thin Solid Films,1993,234:385—389.

[9] [9] Rseler A. Spectroscopic ellipsometry in the infrared［J］. Infrared Phys,1981,21(6):349—355.

[10] [10] Stanislavchuk T N, Kang T D, Rogers P D, et al. Synchrotron radiation-based far-infrared spectroscopic ellipsometer with full Mueller-matrix capability［J］. Rev. Sci. Instrum,2013,84(2):2668—497.

[11] [11] Andreas F, Cordula W, Matthias Z, et al. Broadband infrared Mueller-matrix ellipsometry for studies of structured surfaces and thin films［J］. Appl. Opt,2018,57(27):7895.

[14] [14] Goldstein, Dennis H. Mueller matrix dual-rotating retarder polarimeter［J］. Appl. Opt,1992,31(31):6676—6683.

[15] [15] Hilfiker J N, Hong N, Schoeche S. Mueller matrix spectroscopic ellipsometry［J］. Adv Opt Technol,2022,11(3):59—91.

[16] [16] Fan L, Huang Z. Simulated annealing-simplex hybrid algorithm for ellipsometric data inversion of multilayer films［J］. Rev Sci Instrum,2013,84(6):063103.