Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Chinese Journal of Lasers, Volume. 44, Issue 3, 303004(2017)

Impact of Carbon Contamination Cleaning Technologies on Reflectivity of Extreme Ultraviolet Lithography Optics

Wang Yi1,2, Lu Qipeng1, and Gao Yunguo1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (15)
    Cited By (1)
    Tools
    Paper Information
    Topics
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    Wang Yi, Lu Qipeng, Gao Yunguo. Impact of Carbon Contamination Cleaning Technologies on Reflectivity of Extreme Ultraviolet Lithography Optics[J]. Chinese Journal of Lasers, 2017, 44(3): 303004

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: materials and thin films

    Received: Nov. 4, 2016

    Accepted: --

    Published Online: Mar. 8, 2017

    The Author Email:

    DOI:10.3788/cjl201744.0303004

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology