Chinese Journal of Lasers, Volume. 44, Issue 3, 303004(2017)

Impact of Carbon Contamination Cleaning Technologies on Reflectivity of Extreme Ultraviolet Lithography Optics

Wang Yi1,2, Lu Qipeng1, and Gao Yunguo1
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  • 2[in Chinese]
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    Wang Yi, Lu Qipeng, Gao Yunguo. Impact of Carbon Contamination Cleaning Technologies on Reflectivity of Extreme Ultraviolet Lithography Optics[J]. Chinese Journal of Lasers, 2017, 44(3): 303004

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    Paper Information

    Category: materials and thin films

    Received: Nov. 4, 2016

    Accepted: --

    Published Online: Mar. 8, 2017

    The Author Email:

    DOI:10.3788/cjl201744.0303004

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