Chinese Journal of Lasers, Volume. 40, Issue 7, 707003(2013)

Mechanical Properties of HfO2/SiO2 Thin Films on Different Substrates

Wang He1,2、*, He Hongbo1, and Zhang Weili1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(14)

    [1] [1] J E Greusic, H M Marcos, L G Uitert. Laser oscillation in ND-doped yttrium aluminium, yttrium gallium, and gadolinium garnets[J]. Appl Phys Lett, 1964, 4(10): 182-186.

    [2] [2] Lu Tingting, Wang Juntao, Huang Minjie, et al.. Simulataneous multr-wavelength pulsed laser in diode-end-pumped NdYLF/NdYAG[J]. Chinese J Lasers, 2012, 39(9): 0902002.

    [4] [4] Fan Zhengxiu. Development and recent progress of optical thin films[J]. Acta Optica Sinica, 2011, 31(9): 0900131.

    [5] [5] J Yin, Z G Liu, H Liu, et al.. The epitaxial growth of wurtzite ZnO films on LiNbO3 (0001) substrates[J]. J Cryst Growth, 2000, 220(3): 281-285.

    [6] [6] Q Zhang, S F Yoon, S Zhgoon, et al.. Study of diamond-like carbon films on LiNbO3[J]. Thin Solid Films, 2000, 360(1-2): 274-277.

    [7] [7] R H Kim, H H Park, G T Joo. The growth of LiNbO3(006) on MgO(001) and LiTaO3(012) substrates by sol-gel procedure[J]. Appl Surf Sci, 2001, 169-170: 564-569.

    [8] [8] A Karimi, Y Wang, T Cselle, et al.. Fracture mechanisms in nanoscale layered hard thin films[J]. Thin Solid Films, 2002, 420-421: 275-280.

    [9] [9] S A Kulinich, T Yamaki, S Bysakh, et al.. Epitaxial LiNb0.5Ta0.5O3 films on LiTaO3 and LiNbO3 substrates grown by thermal plasma[J]. J Cryst Growth, 2003, 247(3-4): 408-418.

    [10] [10] O Nakagawara, M Saeki, M Watanabe, et al.. Epitaxially grown aluminum films with titanium intermediate layer on theta rotated Y-X LiNbO3 piezoelectric single crystal substrates[J]. J Cryst Growth, 2003, 249(3-4): 497-501.

    [11] [11] M Alvisi, M Di Giulioa, S G Marrone. HfO2 films with high laser damage threshold[J]. Thin Solid Films, 2000, 358(1-2): 250-258.

    [12] [12] Li Dawei, Tao Chunxian, Li Xiao, et al.. Comparsion of laser induced damage at 1064 nm and 532 nm to high-reflective film fabricated by electron beam evaporation[J]. High Power Laser and Particle Beams, 2008, 20(9): 1457-1460.

    [14] [14] Zhao Miao, Zhou Daibing, Tan Manqing, et al.. Preparation of Si/SiO2 optical thin film by double source electron beam evaporation technology[J]. J. Semiconductors, 2006, 27(9): 1586-1589.

    CLP Journals

    [1] Guo Jialu, Liu Xiaofeng, Zhao Yuanan, Shao Jianda, Zhao Jiaoling, Huang Haopeng, Cui Yanyan. Effect of Substrate′s Crystalline Structure on Crystalline and Mechanical Properties of HfO2 Thin Films[J]. Chinese Journal of Lasers, 2016, 43(6): 603001

    [2] Du Qianqian, Wang Wenjun, Li Shuhong, Liu Yunlong, He Xiaoxiao, Gao Xuexi, Zhang Bingyuan, Shi Qiang. Influence of Substrate Temperature on SiO2 Thin Films by Electron Beam Deposition[J]. Chinese Journal of Lasers, 2014, 41(10): 1007002

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    Wang He, He Hongbo, Zhang Weili. Mechanical Properties of HfO2/SiO2 Thin Films on Different Substrates[J]. Chinese Journal of Lasers, 2013, 40(7): 707003

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    Paper Information

    Category: materials and thin films

    Received: Jan. 11, 2013

    Accepted: --

    Published Online: Jun. 9, 2013

    The Author Email: He Wang (wanghe@siom.ac.cn)

    DOI:10.3788/cjl201340.0707003

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