Chinese Journal of Lasers, Volume. 40, Issue 7, 707003(2013)

Mechanical Properties of HfO2/SiO2 Thin Films on Different Substrates

Wang He1,2、*, He Hongbo1, and Zhang Weili1
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    Wang He, He Hongbo, Zhang Weili. Mechanical Properties of HfO2/SiO2 Thin Films on Different Substrates[J]. Chinese Journal of Lasers, 2013, 40(7): 707003

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    Paper Information

    Category: materials and thin films

    Received: Jan. 11, 2013

    Accepted: --

    Published Online: Jun. 9, 2013

    The Author Email: He Wang (wanghe@siom.ac.cn)

    DOI:10.3788/cjl201340.0707003

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