Review on the Progress of Parallel Micro/Nano Lithography Based on Spatial Light Modulator

Junjie Kuang; Ningning Luo; Jingya Zhang; Yanlei Wang; Xin Xiong; Qingwang Meng

doi:10.3788/LOP202259.1100009

Laser & Optoelectronics Progress, Volume. 59, Issue 11, 1100009(2022)

Review on the Progress of Parallel Micro/Nano Lithography Based on Spatial Light Modulator

Junjie Kuang^1,2, Ningning Luo^1,2、*, Jingya Zhang^1,2, Yanlei Wang^1,2, Xin Xiong^1,2, and Qingwang Meng^1,2

¹Key Laboratory of Opto-Electronic Information Science and Technology of Jiangxi Province, Nanchang Hangkong University, Nanchang 330063, Jiangxi , China

²Jiangxi Engineering Laboratory for Opto-Electronic Measuring Technology, Nanchang Hangkong University, Nanchang 330063, Jiangxi , China

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Junjie Kuang, Ningning Luo, Jingya Zhang, Yanlei Wang, Xin Xiong, Qingwang Meng. Review on the Progress of Parallel Micro/Nano Lithography Based on Spatial Light Modulator[J]. Laser & Optoelectronics Progress, 2022, 59(11): 1100009

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Paper Information

Category: Reviews

Received: Jan. 28, 2022

Accepted: Apr. 2, 2022

Published Online: Jun. 9, 2022

The Author Email: Ningning Luo (ningningluo2002@126.com)

DOI:10.3788/LOP202259.1100009

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology