Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask

Wei Cheng; Sikun Li; Xiangzhao Wang; Zinan Zhang

doi:10.3788/AOS202040.1005001

Acta Optica Sinica, Volume. 40, Issue 10, 1005001(2020)

Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask

Wei Cheng^1,2, Sikun Li^1,2、*, Xiangzhao Wang^1,2、**, and Zinan Zhang^1,2

¹Laboratory of Information Optics and Opt-electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Wei Cheng, Sikun Li, Xiangzhao Wang, Zinan Zhang. Method for Profile Reconstruction of Phase Defects in Extreme Ultraviolet Lithography Mask[J]. Acta Optica Sinica, 2020, 40(10): 1005001

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Paper Information

Category: Diffraction and Gratings

Received: Dec. 30, 2019

Accepted: Feb. 14, 2020

Published Online: Apr. 28, 2020

The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)

DOI:10.3788/AOS202040.1005001

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