Fig. 1. Sketch diagram of step & scan projection lithography machine

Fig. 2. Block diagram of advanced motion control system

Fig. 3. Basic block diagram of 6-DOF motion control system

Fig. 4. Block diagram of nonlinear feedback control system

Fig. 5. Block diagram of inverse model disturbance observer

Fig. 6. Horizontal step scanning trajectory of the wafer stage during lithography exposure

Fig. 7. Structure diagram of two DOF control system based on ILC. (a) Series structure; (b) parallel structure

Fig. 8. Sketch diagram of ILC compensation effect

Fig. 9. Control effects of ILC and IFFT with reference trajectory changes

Fig. 10. Two degrees of freedom motion control structure based on IFFT

Fig. 11. Control block diagram of micromotion following macromotion

Fig. 12. Control block diagram of macromotion following micromotion

Fig. 13. Block diagram of synchronous control between reticle stage and wafer stage

Fig. 14. Sketch diagram of trapezoidal velocity curve and third-order S-curve

Fig. 15. Sketch diagram of shaping technology design principle

Fig. 16. Flow chart of input shaping

Fig. 17. Structure sketch diagram of shaping technology application