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Laser & Optoelectronics Progress, Volume. 53, Issue 12, 123101(2016)

Characteristics of Compactness of SiO2 Thin Films Prepared by PECVD Method

Xiao Heping*, Sun Rujian, Ma Xiangzhu, Yang Kai, and Zhang Shuangxiang
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    Xiao Heping, Sun Rujian, Ma Xiangzhu, Yang Kai, Zhang Shuangxiang. Characteristics of Compactness of SiO2 Thin Films Prepared by PECVD Method[J]. Laser & Optoelectronics Progress, 2016, 53(12): 123101

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    Paper Information

    Category: Thin Films

    Received: Jun. 27, 2016

    Accepted: --

    Published Online: Dec. 14, 2016

    The Author Email: Xiao Heping (ietgu@163.com)

    DOI:10.3788/lop53.123101

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology