Laser & Optoelectronics Progress, Volume. 53, Issue 12, 123101(2016)

Characteristics of Compactness of SiO2 Thin Films Prepared by PECVD Method

Xiao Heping*, Sun Rujian, Ma Xiangzhu, Yang Kai, and Zhang Shuangxiang
Author Affiliations
  • [in Chinese]
  • show less
    Cited By

    Article index updated: Sep. 15, 2025

    The article is cited by 3 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Xiao Heping, Sun Rujian, Ma Xiangzhu, Yang Kai, Zhang Shuangxiang. Characteristics of Compactness of SiO2 Thin Films Prepared by PECVD Method[J]. Laser & Optoelectronics Progress, 2016, 53(12): 123101

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Thin Films

    Received: Jun. 27, 2016

    Accepted: --

    Published Online: Dec. 14, 2016

    The Author Email: Xiao Heping (ietgu@163.com)

    DOI:10.3788/lop53.123101

    Topics