Laser & Optoelectronics Progress, Volume. 53, Issue 12, 123101(2016)
Characteristics of Compactness of SiO2 Thin Films Prepared by PECVD Method
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Xiao Heping, Sun Rujian, Ma Xiangzhu, Yang Kai, Zhang Shuangxiang. Characteristics of Compactness of SiO2 Thin Films Prepared by PECVD Method[J]. Laser & Optoelectronics Progress, 2016, 53(12): 123101
Category: Thin Films
Received: Jun. 27, 2016
Accepted: --
Published Online: Dec. 14, 2016
The Author Email: Xiao Heping (ietgu@163.com)