Fig. 1. Schematic of a chain of nanosecond laser facility

Fig. 2. Schematic of a chain of picosecond pat-watt laser facility

Fig. 3. Design process of high power laser facility

Fig. 4. Overall lightpath layout of nanosecond laser facility

Fig. 5. Overall lightpath layout of picosecond pat-watt laser facility

Fig. 6. Lightpath of main amplifier system

Fig. 7. Aberration distributions of single-pass and four-pass near-field of CSF. (a) Single-pass aberration; (b) four-pass aberration

Fig. 8. Wavefront and PSF distribution of TSF (inclined angle is 0.98°). (a) Wavefront distribution; (b) PSF distribution

Fig. 9. Full lightpath aberration distributions of main amplifier system

Fig. 10. Section view of final optics assembly

Fig. 11. Eight nanosecond beams configuration of target bay

Fig. 12. Schematic of pencil ghost beam formation

Fig. 13. Ghost image distribution of the final optimization scheme. (a) Wedge lens is in the +15 mm position of the relative zero position; (b) wedge lens is in the -15 mm position of the relative zero position; (c) target surface is considered for 2% reflection

Fig. 14. Transverse optical field distribution of defect of r=0.2 mm, ϕ= π/2, and t=1, as the Fresnel numbers take different values. (a) N=7; (b) N=4; (c) N=1; (d) N<1

Fig. 15. Lightpath model of multi-peak thermal image^[27]. P₁ represents the first thermal image plane, P₂ represents the conjugate plane, and P₃ represents the second thermal image plane

Fig. 16. Transmission evolution of transverse optical field with different defects along axial direction, and the red dotted line represents the position of the thermal image plane^[27]. (a) Super-Gaussian defect; (b) Gaussian defect

Fig. 17. Aberration analysis of single TSF lens

Fig. 18. Detection scheme for telephoto lenses

Fig. 19. Deformation contours of the mirror with different preload forces^[31]. (a) Deformation contours of the mirror with different preload forces; (b) FEM result of the relationship between PV value and RMS value with different preload forces

Fig. 20. Surface quality of large aperture mirror under bending moment on the fringe. (a) Results of deformation contours of the mirror with different preload forces by phase modulation method; (b) result of the relationship between PV value and RMS value with different preload forces

Fig. 21. Intensity and power spectrum distribution of near-field of high power laser system (No.20160906002). (a) Intensity distribution; (b) PSD power spectrum distribution

Fig. 22. Intensity and incircle fluence distribution of far-field of high power laser system. (a) Far-field intensity distribution; (b) incircle fluence distribution

Fig. 23. High-magnification attenuation design of main two-stage darkroom in the multi-range amplification configuration (width is 11 cm)

Fig. 24. Results of coherent modulation imaging in high power laser system^[34]. (a) Recorded diffraction pattern, the magnified view is presented in the top-right corner; (b) reconstructed illumination distribution on the phase plate,the amplitude distribution is presented on the left and the phase distribution is presented on the right; (c) intensity in a series of planes with different deviation distances to focus plane according to numerical calculation, and the distance between the adjacent planes is 4 mm; (d) 3D intensity distribution of focal point; (e) reconstructed amplitude distribution of USAF 1951 that is placed near a convergent lens

Fig. 25. Main functions and structures of beam near-field control system with three-level shaping function

Fig. 26. Super-Gaussian distribution and the influence of spatial filter. (a) One-dimensional intensity distribution of super-Gaussian beam; (b) influence of super-Gaussian order on beam filling factor with different spatial filtering holes (d_DL: diffraction limit)

Fig. 27. Scheme and effect of beam shaping. (a) Control flow of beam near-field optimization; (b) two types of beam shapers and their shaping effects (1—dielectric-film binary amplitude mask; 2—spot with high filling factor; 3—optically addressed spatial light modulator; 4—arbitrary shaped beam)

Fig. 28. Fitting results of driving surface and aberration of the deformable mirror. (a) Driving surface of the deformable mirror; (b) fitting ability of the deformable mirror to the first 36 Zernike polynomials

Fig. 29. CPP design surface and corresponding output circular focal spot. (a) CPP design surface; (b) CPP output focal spot

Fig. 30. Experimental results of 1 mm circular focal spot shaping by CPP^[1]. (a) Focal spot contour obtained only by CPP technology;(b) focal spot contour obtained by time scanning SSD technology and CPP technology

Fig. 31. Terminal target focal spot of the system before and after chromatic aberration compensation^[56]. (a)(c) Before compensation;(b)(d) after compensation

Fig. 32. Beam transmission model of the SG Ⅱ device^［59］

Fig. 33. Compliance curves before and after pouring cement of a truss in the SG Ⅱ eight-way upgrade device^[59]

Fig. 34. Schematic of alignment lightpath in the preamplifier alignment system^[64]

Fig. 35. Schematic of alignment lightpath in the multi-pass main amplifier^[64]

Fig. 36. Target positioning and pointing system of SG-Ⅱ-U

Fig. 37. Basic opto-mechanical structure of CCRS^[69]

Fig. 38. TAS observing system and lightpath structure^［70］. (a) Observing system; (b) lightpath structure