Researching | Fabrication of sub-diffraction limit high-aspect-ratio nanostructures via laser direct writing

Chinese Optics Letters, Volume. 23, Issue 3, 033602(2025)

Fabrication of sub-diffraction limit high-aspect-ratio nanostructures via laser direct writing On the Cover

Guoliang Chen¹, Houan Teng¹, Jian Chen¹, and Qiwen Zhan^1,2,3、*

Author Affiliations

¹School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China

²Zhangjiang Laboratory, Shanghai 201204, China

³International Institute for Sustainability with Knotted Chiral Meta Matter (WPI-SKCM2), Hiroshima University, Hiroshima 739-8526, Japan

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References(32)

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Guoliang Chen, Houan Teng, Jian Chen, Qiwen Zhan, "Fabrication of sub-diffraction limit high-aspect-ratio nanostructures via laser direct writing," Chin. Opt. Lett. 23, 033602 (2025)

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Paper Information

Category: Nanophotonics, Metamaterials, and Plasmonics

Received: Jun. 27, 2024

Accepted: Apr. 9, 2024

Posted: Sep. 4, 2024

Published Online: Mar. 31, 2025

The Author Email: Qiwen Zhan (qwzhan@usst.edu.cn)

DOI:10.3788/COL202523.033602

CSTR:32184.14.COL202523.033602

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology