Semiconductor Optoelectronics, Volume. 45, Issue 2, 222(2024)

Influence of Ionization Effect on Gain of Electron Multiplying Layer in EBCMOS

CHEN Wene1, CHEN Weijun1, SONG De1, JIAO Gangcheng2, LI Ye1, ZHAO Peng1, LI Shuhan1, WANG Chongxiao1, LIANG Rongxuan1, and YUE Jipeng1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    References(20)

    [1] [1] Aebi V W,Boyle J J. Electron bombarded active pixel sensor[Z]. US. 6285018B, 2001: 09-04.

    [2] [2] Hirvonen L M, Suhling K. Photon counting imaging with an electron-bombarded pixel image sensor[J]. Sensors, 2016, 16(5): 617-629.

    [3] [3] Dominjon A, Ageron M, Barbier R, et al. An EBCMOS camera system for marine bioluminescence observation: The luSEapher prototype[J]. Nucl. Instrum. Meth. A, 2012,695: 172-178.

    [4] [4] Barbier R, Winter M, Laurent N, et al. First results from the development of a new generation of hybrid photon detector: EBCMOS[C]// 10th Inter. Conf. on Advanced Technol. and Particle Physics, 2008, 4: 23.

    [5] [5] Sobottka S B, Meyer T, Kirsch M, et al. Evaluation of the clinical practicability of intraoperative optical imaging comparing three different camera setups[J]. Biomed. Tech.,2013, 58(3): 237-248.

    [6] [6] Pisecny P, Husekova K, Frohlich K, et al. Growth of lanthanum oxide films for application as a gate dielectric in CMOS technology[J]. Mat. Sci. Semicon. Proc., 2004, 7(4/6): 231-236.

    [7] [7] Aebi V, Costello K A, Arcuni P W, et al. EBAPS: next generation, low power, digital night vision[C]// OPTRO 2005 Inter. Symp., 2005: 14667687.

    [8] [8] Barbier R, Baudot J, Chabanat E, et al. Performance study of a mega pixel single photon position sensitive photodetector EBCMOS[J]. Nucl. Instrum. Meth. A, 2009, 610(1): 54-56.

    [9] [9] Barbier R, Cajgfinger T, Calabria P, et al. A single-photon sensitive EBCMOS camera: The LUSIPHER prototype[J].Nucl. Instrum. Meth. A, 2011, 648(1): 266-274.

    [10] [10] Chrzanowski K. Review of night vision technology[J].Opto.-electron. Rev., 2013, 21(2): 149-164.

    [12] [12] Bai J Z, Wang B, Bai Y L, et al. Optimum design of electron bombarded active pixel sensor for low-level light single photon imaging[C]// Proc. SPIE 10843, 9th Inter. Symp.on Adv. Optical Manufacturing and Testing Technologies:Optoelectronic Materials and Devices for Sensing and Imaging, 2019: 108430V.

    [13] [13] Yan L, Shi F, Cheng H C, et al. Research status of dark current in CMOS image sensor[C]// Proc. SPIE 11763,Seventh Symposium on Novel Photoelectronic Detection Technology and Applications, 2021, 1176340.

    [14] [14] Li T T, Xiao C, Jiao G C, et al. Research on noise characteristics of EBAPS digital low light level device[C]//Proc. SPIE 12617, Ninth Symposium on Novel Photoelectronic Detection Technology and Applications,2023, 126176F.

    [15] [15] Yang Y, Han K, Yan L, et al. Study on effect of different temperatures on imaging performance of EBAPS devices[J].Proc. SPIE 11763, Seventh Symp. on Novel Photoelectronic Detection Technology and Applications, 2021, 11763:117634T.

    [16] [16] Wang X N, Song D, Jiao G C, et al. Characterising backscattered electrons in EBCMOS[J]. IEEE Photonics J.,2022, 14(6): 6858605.

    [18] [18] Shakoor S M K, Zou Y B, Chao L, et al. Monte Carlo simulation of secondary electron emission from wave type structure[J]. J. of University of Science and Technol. of China, 2019, 49(1): 79-86.

    [19] [19] Jablonski A, Tanuma S, Powell C J. New universal expression for the electron stopping power for energies between 200eV and 30keV[J]. Surf. Interface Anal.,2006, 38(2): 76-83.

    [20] [20] Jablonski A, Tanuma S, Powell C J. Modified predictive formula for the electron stopping power[J]. J. Appl. Phys.,2008, 103(6): 063708.

    [22] [22] Fiebiger J R, Muller R S. Pair production energies in silicon and germanium bombarded with low energy electrons[J]. J.Appl. Phys., 1972, 43(7): 3202-3207.

    [23] [23] Omotoso E, Meyer W E, Auret F D, et al. The influence of high energy electron irradiation on the Schottky barrier height and the Richardson constant of Ni/4H-SiC Schottky diodes[J]. Mat. Sci. Semicon. Proc., 2015, 39: 112-118.

    Tools

    Get Citation

    Copy Citation Text

    CHEN Wene, CHEN Weijun, SONG De, JIAO Gangcheng, LI Ye, ZHAO Peng, LI Shuhan, WANG Chongxiao, LIANG Rongxuan, YUE Jipeng. Influence of Ionization Effect on Gain of Electron Multiplying Layer in EBCMOS[J]. Semiconductor Optoelectronics, 2024, 45(2): 222

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Dec. 18, 2023

    Accepted: --

    Published Online: Aug. 14, 2024

    The Author Email:

    DOI:10.16818/j.issn1001-5868.2023121801

    Topics