Journal of Optoelectronics · Laser, Volume. 35, Issue 9, 987(2024)

Studies on the growth and physical properties of GaN thin films assisted by high-energy N plasma sources

HU Haizheng, HE Huaile, LAI Li, WANG Shunli, WU Chao, and GUO Daoyou
Author Affiliations
  • School of Science, Zhejiang Sci Tech University, Hangzhou, Zhejiang 310018, China
  • show less
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    HU Haizheng, HE Huaile, LAI Li, WANG Shunli, WU Chao, GUO Daoyou. Studies on the growth and physical properties of GaN thin films assisted by high-energy N plasma sources[J]. Journal of Optoelectronics · Laser, 2024, 35(9): 987

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Feb. 1, 2024

    Accepted: Dec. 20, 2024

    Published Online: Dec. 20, 2024

    The Author Email:

    DOI:10.16136/j.joel.2024.09.0067

    Topics